Dr. Karen Dabertrand Profile

Dr. Karen Dabertrand

at STMicroelectronics

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 2 April 2010 Paper

Improved CD control for 45-40 nm CMOS logic patterning: anticipation for 32-28 nm

Bertrand Le Gratiet, Frank Sundermann, Jean Massin, Marianne Decaux, Nicolas Thivolle, Fabrice Baron, Alain Ostrovsky, Cedric Monget, Jean Damien Chapon, Yoann Blancquaert, Karen Dabertrand, Lionel Thevenon, Benedicte Bry, Nicolas Cluet, Bertrand Borot, Raphael Bingert, Thierry Devoivre, Pascal Gourard, Laurène Babaud, Ute Buttgereit, Robert Birkner, Mark Joyner, Erez Graitzer, Avi Cohen

Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV

KEYWORDS: Metrology, Logic, Optical lithography, Etching, Scanners, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

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Proceedings Article | 24 March 2009 Paper

Intrafield process control for 45 nm CMOS logic patterning

Bertrand Le Gratiet, Jean Massin, Alain Ostrovski, Cedric Monget, Marianne Decaux, Nicolas Thivolle, Romuald Faure, Fabrice Baron, Jean-Damien Chapon, Karen Dabertrand, Frank Sundermann, Pascal Gouraud, Laurène Babaud, Lionel Thevenon, Nicolas Cluet, Boris VandeWalle

Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII

KEYWORDS: Reticles, Metrology, Logic, Optical lithography, Scanners, Scatterometry, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 22 March 2008 Paper

Process control for 45 nm CMOS logic gate patterning

Bertrand Le Gratiet, Pascal Gouraud, Enrique Aparicio, Laurene Babaud, Karen Dabertrand, Mathieu Touchet, Stephanie Kremer, Catherine Chaton, Franck Foussadier, Frank Sundermann, Jean Massin, Jean-Damien Chapon, Maxime Gatefait, Blandine Minghetti, Jean de-Caunes, Daniel Boutin

Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII

KEYWORDS: Reticles, Optical lithography, Etching, Scanners, Scatterometry, Process control, Photomasks, Immersion lithography, Critical dimension metrology, Semiconducting wafers

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Proceedings Article | 22 March 2008 Paper

Industrial characterization of scatterometry for advanced APC of 65 nm CMOS logic gate patterning

Karen Dabertrand, Mathieu Touchet, Stephanie Kremer, Catherine Chaton, Maxime Gatefait, Enrique Aparicio, Marco Polli, Jean-Claude Royer

Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII

KEYWORDS: Carbon, Optical lithography, Diffractive optical elements, Etching, Scanning electron microscopy, Scatterometry, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Single crystal X-ray diffraction

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