Dr. Karen Dabertrand
at STMicroelectronics
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Metrology, Logic, Optical lithography, Etching, Scanners, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Reticles, Metrology, Logic, Optical lithography, Scanners, Scatterometry, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 22 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Reticles, Optical lithography, Etching, Scanners, Scatterometry, Process control, Photomasks, Immersion lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 22 March 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Carbon, Optical lithography, Diffractive optical elements, Etching, Scanning electron microscopy, Scatterometry, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Single crystal X-ray diffraction

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top