Dr. Karl Kragler Profile

Dr. Karl Kragler

at ams-OSRAM International GmbH

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 4 May 2005 Paper

Comparison of resist outgassing at wavelengths from 193 nm to 13 nm

Wolf-Dieter Domke, Karl Kragler, Marion Kern, Klaus Lowack, Oliver Kirch, Michele Bertolo

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599543

KEYWORDS: Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Spectroscopy, Synchrotrons, Ions, Chromatography, Diffusion, Molecules, 193nm lithography

Read Abstract +

Proceedings Article | 16 August 2002 Paper

Ion projection lithography (IPL): posters presented at the 5th Intrnational SEMATECH Next-Generation Lithography (NGL) workshop

Rainer Kaesmaier, Hans Loeschner, Patrick de Jager, Albrecht Ehrmann, Stefan Hirscher, Karl Kragler, Reinhard Springer, Gerhard Stengl, Andreas Wolter

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479338

KEYWORDS: Semiconducting wafers, Ions, Photomasks, Ion beams, Projection lithography, Lithography, Photodynamic therapy, Electrodes, Helium, Distortion

Read Abstract +

Proceedings Article | 20 August 2001 Paper

Progress in placement control for ion beam stencil mask technology

Frank-Michael Kamm, Albrecht Ehrmann, Thomas Struck, Karl Kragler, Joerg Butschke, Florian Letzkus, Reinhard Springer, Ernst Haugeneder

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436673

KEYWORDS: Photomasks, Semiconducting wafers, Ions, Etching, Projection lithography, Boron, Carbon, Beam controllers, Ion beams, Optical lithography

Read Abstract +

Proceedings Article | 9 April 2001 Paper

Progress in placement control for ion beam stencil mask technology

Frank-Michael Kamm, Albrecht Ehrmann, Thomas Struck, Karl Kragler, Joerg Butschke, Florian Letzkus, Reinhard Springer, Ernst Haugeneder, Artur Degen, Jens Voigt, Martin Kratzenberg, Ivo Rangelow

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425098

KEYWORDS: Photomasks, Ions, Semiconducting wafers, Carbon, Oxides, Lithography, Beam controllers, Ion beams, Ion implantation, Deposition processes

Read Abstract +

Proceedings Article | 21 July 2000 Paper

Resist technologies for ion projection lithography (IPL) stencil maskmaking

Mathias Irmscher, Joerg Butschke, Klaus Elian, Bernd Hoefflinger, Karl Kragler, Florian Letzkus, Joerg Ochsenhirt, Christian Reuter, Reinhard Springer

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390072

KEYWORDS: Etching, Silicon, Carbon, Photomasks, Photoresist processing, Lithography, Ions, Silicon carbide, Mask making, Semiconducting wafers

Read Abstract +

Proceedings Article | 23 April 1999 Paper

PN and SOI wafer flow process for stencil mask fabrication

Joerg Butschke, Albrecht Ehrmann, Ernst Haugeneder, Mathias Irmscher, Rainer Kaesmaier, Karl Kragler, Florian Letzkus, Hans Loeschner, Josef Mathuni, Ivo Rangelow, Carsten Reuter, Feng Shi, Reinhard Springer

Proceedings Volume 3665, (1999) https://doi.org/10.1117/12.346224

KEYWORDS: Etching, Semiconducting wafers, Silicon, Photomasks, Oxides, Electrochemical etching, Metals, Lithography, Ions, Wafer bonding

Read Abstract +

Proceedings Article | 18 December 1998 Paper

Stencil mask technology for ion beam lithography

Albrecht Ehrmann, Sabine Huber, Rainer Kaesmaier, Andreas Oelmann, Thomas Struck, Reinhard Springer, Joerg Butschke, Florian Letzkus, Karl Kragler, Hans Loeschner, Ivo Rangelow

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332827

KEYWORDS: Photomasks, Semiconducting wafers, Silicon, Ions, Etching, Carbon, Control systems, Ion beam lithography, Lithography, Inspection

Read Abstract +

Showing 5 of 7 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years