Katsuhiro Yamashita
at FUJIFILM Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72733S (2009) https://doi.org/10.1117/12.812204
KEYWORDS: Polymers, Line width roughness, Diffusion, Extreme ultraviolet lithography, Photomasks, Electroluminescence, Semiconducting wafers, Glasses, Extreme ultraviolet, Image resolution

Proceedings Article | 1 April 2009 Paper
Hideaki Tsubaki, Tooru Tsuchihashi, Katsuhiro Yamashita, Tomotaka Tsuchimura
Proceedings Volume 7273, 72733P (2009) https://doi.org/10.1117/12.814086
KEYWORDS: Polymers, Extreme ultraviolet lithography, Yield improvement, Extreme ultraviolet, Ionization, Line width roughness, Semiconducting wafers, Electrodes, Absorption, Chemically amplified resists

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