Mr. Katsuji Doki Profile

Katsuji Doki

at JSR Micro Inc

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Author

Publications (5)

Proceedings Article | 12 June 2003 Paper

Fluoropolymer resists for 157-nm lithography

Vaishali Vohra, Xiang-Qian Liu, Katsuji Douki, Christopher Ober, Will Conley, Paul Zimmerman, Daniel Miller

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485097

KEYWORDS: Polymers, Silicon, Fluorine, Lithography, Transparency, Polymerization, Absorbance, Photoresist materials, Resistance, Scanning electron microscopy

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Proceedings Article | 24 July 2002 Paper

Highly transparent resist platforms for 157-nm microlithography: an update

Vaishali Vohra, Katsuji Douki, Young-Je Kwark, Xiang-Qian Liu, Christopher Ober, Young Bae, Will Conley, Daniel Miller, Paul Zimmerman

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474169

KEYWORDS: Polymers, Fluorine, Transparency, Polymerization, Etching, Lithography, Resistance, Absorbance, Scanning electron microscopy, Photoresist materials

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Proceedings Article | 23 June 2000 Paper

High-performance 193-nm positive resist using alternating polymer system of functionalized cyclic olefins/maleic anhydride

Katsuji Douki, Toru Kajita, Tsutomu Shimokawa

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388277

KEYWORDS: Etching, Polymers, Resistance, Lithography, Carbon, Polymerization, Chemical species, Binary data, Photomasks, Lithographic illumination

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Proceedings Article | 23 June 2000 Paper

Design and lithographic performances of 193-specific photoacid generators

Hiroyuki Ishii, Shinji Usui, Katsuji Douki, Toru Kajita, Hitoshi Chawanya, Tsutomu Shimokawa

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388276

KEYWORDS: Transparency, Absorption, Ultraviolet radiation, Oscillators, Lithography, Molybdenum, Deep ultraviolet, Transmittance, Polymethylmethacrylate, Scanning electron microscopy

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Proceedings Article | 29 June 1998 Paper

Design of i-line photoresist capable of sub-quarter-micron lithography: effects of novel phenolic resin with controlled end group

Katsuji Douki, Toru Kajita, Shin-Ichiro Iwanaga

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312428

KEYWORDS: Photoresist materials, Lithography, Picture Archiving and Communication System, Polymers, Polymerization, Lithographic illumination, Carbon, Calcium, Hydrogen, Molecules

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