Dr. Kaushal D. Vora Profile

Dr. Kaushal D. Vora

at Australian National Univ

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 30 December 2019 Paper

Tailoring directional scattering of second-harmonic generation from (111)-GaAs nanoantennas

M. Rahmani, J. Sautter, L. Xu, A. Miroshnichenko, M. Lysevych, I. Volkovskaya, D. Smirnova, M. Camacho Morales, K. Zangeneh Kamali, F. Karouta, K. Vora, H. H. Tan, M. Kauranen, I. Staude, C. Jagadish, D. Neshev

Proceedings Volume 11200, 112000H (2019) https://doi.org/10.1117/12.2539086

KEYWORDS: Nanoantennas, Second-harmonic generation, Polarization, Scattering, Harmonic generation, Group III-V semiconductors, Crystals, Nanolithography, Laser scattering, Physics

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Proceedings Article | 21 September 2017 Presentation

Directional second harmonic generation from AlGaAs nanoantennas (Conference Presentation)

Maria del Rocio Camacho Morales, Mohsen Rahmani, Sergey Kruk, Lei Wang, Lei Xu, Daria Smirnova, Alexander Solntsev, Andrey Miroshnichenko, Hoe Tan, Fouad Karouta, Shagufta Naureen, Kaushal Vora, Luca Carletti, Costantino De Angelis, Dragomir Neshev, Chennupati Jagadish, Yuri Kivshar

Proceedings Volume 10343, 103430J (2017) https://doi.org/10.1117/12.2273553

KEYWORDS: Second-harmonic generation, Harmonic generation, Group III-V semiconductors, Nonlinear optics, Glasses, Frequency conversion, Plasmonics, Nanostructures, Signal attenuation, Resistance

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Proceedings Article | 15 August 2017 Presentation

Highly directional second-harmonic generation from AlGaAs nanoparticles (Conference Presentation)

Mohsen Rahmani, Shagufta Naureen, Kaushal Vora, Maria del Rocio Camacho Morales, Sergey Kruk, Lei Wang, Lei Xu, Daria Smirnova, Alexander Solntsev, Andrey Miroshnichenko, Hark Hoe Tan, Fouad Karouta, Luca Carletti, Costantino De Angelis, Chennupati Jagadish, Yuri Kivshar, Dragomir Neshev

Proceedings Volume 10228, 102280H (2017) https://doi.org/10.1117/12.2264351

KEYWORDS: Second-harmonic generation, Nonlinear optics, Group III-V semiconductors, Dielectric polarization, Nanolithography, Laser scattering, Scattering, Resistance, Frequency conversion, Dielectrics

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Proceedings Article | 26 September 2013 Paper

Nanostencil lithography for fabrication of III-V nanostructures

Kaushal Vora, Fouad Karouta, Chennupati Jagadish

Proceedings Volume 8816, 88161B (2013) https://doi.org/10.1117/12.2022609

KEYWORDS: Nanolithography, Silicon, Gold, Dry etching, Gallium arsenide, Electron beam lithography, Photomasks, Nanostructures, Metals, Etching

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SPIE Journal Paper | 1 January 2007

Effect of process parameters and packing density on dimensional errors for densely packed high-aspect-ratio SU-8 microstructures in x-ray lithography

Kaushal Vora, Bor-Yuan Shew, Erol Harvey, J. Hayes, Andrew Peele

JM3, Vol. 6, Issue 01, 013004, (January 2007) https://doi.org/10.1117/12.10.1117/1.2712869

KEYWORDS: Diffusion, Photomasks, X-rays, X-ray lithography, Lithography, Polymethylmethacrylate, Synchrotron radiation, Photoresist processing, Photoresist materials, Diffraction

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SPIE Journal Paper | 1 January 2007

Effect of process parameters and packing density on development times for densely packed high-aspect-ratio SU-8 microstructures in x-ray lithography

Kaushal Vora, Bor-Yuan Shew, Erol Harvey, J. Hayes, Andrew Peele

JM3, Vol. 6, Issue 01, 013003, (January 2007) https://doi.org/10.1117/12.10.1117/1.2712868

KEYWORDS: Acoustics, Diffusion, X-rays, Photomasks, X-ray lithography, Calibration, Temperature metrology, Resistance, Signal attenuation, Synchrotron radiation

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Proceedings Article | 21 December 2005 Paper

Process optimisation for compact high aspect ratio SU-8 microstructures using x-ray lithography

E. C. Harvey, J. P. Hayes, A. G. Peele, B. Y. Shew, K. D. Vora

Proceedings Volume 6037, 603701 (2005) https://doi.org/10.1117/12.638457

KEYWORDS: X-rays, Photomasks, X-ray lithography, Diffusion, Lithography, Polymethylmethacrylate, Synchrotron radiation, Photoresist processing, Photoresist materials, Diffraction

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Proceedings Article | 2 April 2004 Paper

Patterning of SU-8 resist structures using CF4

Anthony Holland, Kaushal Vora, Muralidhar Ghantasala, Arnan Mitchell

Proceedings Volume 5276, (2004) https://doi.org/10.1117/12.523903

KEYWORDS: Etching, Surface roughness, Plasma etching, Plasma, Photoresist materials, Metals, Optical lithography, Photomasks, Ions, Photonics

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Showing 5 of 8 publications

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