Kaushik Sah
Principal Engineer at KLA Corporation
SPIE Involvement:
Author
Area of Expertise:
Process Control Solutions , Multivariate analysis & Deep Learning , Design of Experiments , Defect Inspection & metrology , PWQ & EM Simulations , New product development
Websites:
Publications (23)

Proceedings Article | 13 November 2024 Presentation
John Biafore, Mark Smith, Anatoly Burov, Pradeep Vukkadala, Guy Parsey, Cao Zhang, Craig Higgins, Kunlun Bai, Trey Graves, Yi Liu, Janez Krek, Sergei Bakarian, Kyeongeun Ko, Chi-Ping Liu, Alex Arkhipov, Roel Gronheid, Kaushik Sah, Loemba Bouckou, Andrew Cross, Vikram Tolani, Ady Levy
Proceedings Volume PC13215, PC1321509 (2024) https://doi.org/10.1117/12.3034555
KEYWORDS: Extreme ultraviolet lithography, Stochastic processes, Inspection, Extreme ultraviolet, Computational lithography, Photoresist processing, Photoresist materials, Semiconducting wafers, Metrology, Printing

Proceedings Article | 10 April 2024 Presentation + Paper
Syamashree Roy, Arame Thiam, Kaushik Sah, Yannick Feurprier, Nobuyuki Fukui, Kathleen Nafus, Kenichi Miyaguchi, Dieter Van den Heuvel, Balakumar Baskaran, Joost Bekaert, Andrew Cross, Mircea Dusa, Victor Blanco Carballo
Proceedings Volume 12953, 129530X (2024) https://doi.org/10.1117/12.3010868
KEYWORDS: Optical lithography, Semiconducting wafers, Logic, Scanning electron microscopy, Lithography, Design, Extreme ultraviolet

Proceedings Article | 10 April 2024 Poster + Paper
Ray Xu, Zhijin Chen, Chenwei Gong, Di Yin, Khurram Zafar, Kaushik Sah
Proceedings Volume 12955, 129553R (2024) https://doi.org/10.1117/12.3015164
KEYWORDS: Line edge roughness, Semiconducting wafers, Design, Defect detection, Scanning electron microscopy, Line width roughness, Critical dimension metrology, Diffractive optical elements, High volume manufacturing, Bridges

Proceedings Article | 10 April 2024 Poster + Paper
Kaushik Sah, Zhijin Chen, Yao Zhang, Liming Zhang, Cao Zhang, Craig Higgins, Anatoly Burov, Guy Parsey, Pradeep Vukkadala, Roel Gronheid, Arpit Jain, Ramakanth Ramini, Ankur Agrawal, Garima Sharma, Andrew Cross, Syamashree Roy, Victor Blanco
Proceedings Volume 12955, 129553H (2024) https://doi.org/10.1117/12.3011178
KEYWORDS: Stochastic processes, Scanning electron microscopy, Design, Semiconducting wafers, Inspection, Metrology, Extreme ultraviolet lithography, Defect inspection

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12955, 1295537 (2024) https://doi.org/10.1117/12.3010816
KEYWORDS: Metrology, Resistance, Inspection, Critical dimension metrology, Design, Scanning electron microscopy, Overlay metrology, Semiconducting wafers, Defect detection

Showing 5 of 23 publications
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