Dr. Kaveri Jain Profile

Dr. Kaveri Jain

Senior Engineer at Micron Technology Inc

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Author

Publications (5)

Proceedings Article | 25 March 2016 Paper

Fundamental characterization of shrink techniques on negative tone development based dense contact holes

Kaveri Jain, Scott Light

Proceedings Volume 9779, 97790Q (2016) https://doi.org/10.1117/12.2218626

KEYWORDS: Atomic layer deposition, Photoresist materials, Photoresist developing, Dry etching, Etching, Electronics, Materials processing, Optical lithography, Semiconducting wafers, Thin film coatings, Plasma etching, Photomicroscopy, Plasma, Image processing

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Proceedings Article | 16 April 2011 Paper

Resist freezing process challenges of cross pattern applications

Zishu Zhang, Kaveri Jain, Scott Light, Anton deVilliers

Proceedings Volume 7972, 79720E (2011) https://doi.org/10.1117/12.881552

KEYWORDS: Double patterning technology, Etching, Plasma, Photoresist processing, Plasma treatment, Scanning electron microscopy, Chemical reactions, Image processing, Printing, Reflectivity

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Proceedings Article | 16 April 2011 Paper

Predicting resist sensitivity to chemical flare effects though use of exposure density gradient method

Michael Hyatt, Anton DeVilliers, Kaveri Jain

Proceedings Volume 7972, 79721M (2011) https://doi.org/10.1117/12.881597

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Cadmium, Photoresist processing, Chemically amplified resists, Testing and analysis, Imaging devices, Reticles, Manufacturing, Contamination

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Proceedings Article | 4 April 2008 Paper

Characterization of resist and topcoat properties for immersion lithography

Kaveri Jain, Yoshi Hishiro

Proceedings Volume 6923, 692320 (2008) https://doi.org/10.1117/12.773318

KEYWORDS: Fluorine, Polymers, Surface roughness, Sulfur, Semiconducting wafers, Polymer thin films, Atomic force microscopy, Profiling, Immersion lithography, Nitrogen

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Proceedings Article | 26 March 2008 Paper

Characterization of array CD uniformity with respect to pattern density in 193nm dry photolithography

Vishal Sipani, David Kewley, Kaveri Jain, Erik Byers, Bruce Daybell, Anthony Krauth

Proceedings Volume 6923, 69233O (2008) https://doi.org/10.1117/12.773316

KEYWORDS: Reticles, Photoresist materials, Critical dimension metrology, Optical lithography, Photoresist processing, Fluorine, Semiconducting wafers, Polymers, Molecules, Diffusion

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