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Dr. Kazuhiko Komura
at JSR Micro Inc
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Publications (1)
Proceedings Article | 27 March 2014 Paper
Spin-on organic hardmask for topo-patterned substrate
Kazuhiko Komura, Yoshi Hishiro, Goji Wakamatsu, Yoshio Takimoto, Tomoki Nagai, Tooru Kimura, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Noel Arellano, Srinivasan Balakrishnan, Luisa Bozano, Ananthakrishnan Sankaranarayanan, Krishna Bajjuri, Daniel Sanders, Carl Larson, Anuja DeSilva, Martin Glodde
Proceedings Volume 9051, 905115 (2014) https://doi.org/10.1117/12.2046357
KEYWORDS: Fourier transforms, Chemical vapor deposition, Photoresist materials, Resistance, Carbon, Photomasks, Optical lithography, Lithography, Glasses
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