Mr. Kazuhiko Takahashi Profile

Kazuhiko Takahashi

at Fujitsu Ltd

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 14 May 2007 Paper

Study of hot spot detection using neural networks judgment

Norimasa Nagase, Kouichi Suzuki, Kazuhiko Takahashi, Masahiko Minemura, Satoshi Yamauchi, Tomoyuki Okada

Proceedings Volume 6607, 66071B (2007) https://doi.org/10.1117/12.728959

KEYWORDS: Neural networks, Optical proximity correction, Lithography, Image classification, Optics manufacturing, Optical lithography, Machine learning, Feature extraction, Raster graphics

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Proceedings Article | 28 August 2003 Paper

Reticle inspection using an image filter method

Tomoyuki Okada, Masahiko Minemura, Kazuhiko Takahashi, Mitsuo Sakurai, Satoshi Akutagawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504203

KEYWORDS: Image filtering, Reticles, Scanning electron microscopy, Critical dimension metrology, Optical simulations, Photography, Optical filters, Inspection, Image processing, Optics manufacturing

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Proceedings Article | 1 August 2002 Paper

Simulation method using the image filter method

Masahiko Minemura, Kazuhiko Takahashi, Mitsuo Sakurai, Kazuya Sugawa

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476938

KEYWORDS: Image filtering, Fourier transforms, Optical filters, Image processing, Optical simulations, Semiconducting wafers, Optical proximity correction, Gaussian filters, Photomasks, Manufacturing

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Proceedings Article | 19 July 2000 Paper

Mask pattern correction for an advanced device

Yoshimasa Watanabe, Masahiko Minemura, Kazuhiko Takahashi, Tomoyuki Okada, Kojiro Suzuki

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392082

KEYWORDS: Photomasks, Lithography, Data conversion, Laser systems engineering, X-ray technology, Data processing, Optical proximity correction, Logic devices, Critical dimension metrology, Logic

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