Mr. Kazuhiro Takahashi Profile

Kazuhiro Takahashi

Program Manager at Kiyohara Optics Inc.

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 23 March 2020 Presentation + Paper

Presentation + Paper

Through-the-mask (TTM) optical alignment for high volume manufacturing nanoimprint lithography systems

Takafumi Miyaharu, Takamitsu Komaki, Yasuyuki Unno, Kazuhiko Mishima, Takahiro Matsumoto, Toshiki Iwai, Nozomu Hayashi, Tomokazu Taki, Tohru Kawashima, Satoshi Iino, Kazuhiro Takahashi, Shinichirou Hirai, Ken Minoda

Proceedings Volume 11327, 113270Y (2020) https://doi.org/10.1117/12.2551980

KEYWORDS: Optical alignment, Semiconducting wafers, Photomasks, Nanoimprint lithography, Overlay metrology, Error analysis, Wafer testing, Diffraction, High volume manufacturing, Distortion

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Proceedings Article | 23 March 2011 Paper

Paper

Supreme lithographic performance by simple mask layout based on lithography and layout co-optimization

Yuichi Gyoda, Hiroyuki Ishii, Michael Smayling, Valery Axelrad, Tadashi Arai, Koichiro Tsujita, Kazuhiro Takahashi

Proceedings Volume 7973, 79730D (2011) https://doi.org/10.1117/12.878663

KEYWORDS: Photomasks, Lithography, Optical proximity correction, SRAF, Lithographic illumination, Source mask optimization, Binary data, Double patterning technology, Computer programming, Nanoimprint lithography

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Proceedings Article | 23 March 2011 Paper

Paper

Optical lithography applied to 20-nm CMOS Logic and SRAM

K. Takahashi, K. Tsujita, M. Smayling, V. Axelrad

Proceedings Volume 7973, 797314 (2011) https://doi.org/10.1117/12.879522

KEYWORDS: Logic, Scanners, Source mask optimization, Optical lithography, Lithography, Transistors, 193nm lithography, Lithographic illumination, Cadmium, Double patterning technology

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Proceedings Article | 4 March 2010 Paper

Paper

Lithography and layout co-optimization beyond conventional OPC concept

Koji Mikami, Kazuhiro Takahashi, Hiroyuki Ishii, Tadashi Arai, Koichiro Tsujita

Proceedings Volume 7640, 76401A (2010) https://doi.org/10.1117/12.846264

KEYWORDS: Optical proximity correction, Photomasks, Lithography, Source mask optimization, Manufacturing, Lithographic illumination, Scanners, Optical lithography, Composites, Logic devices

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Proceedings Article | 16 March 2009 Paper

Paper

Innovative pattern matching method considering process margin and scanner design information

Hiroyuki Ishii, Takehiro Ueno, Koji Mikami, Shogo Fujie, Kazuhiro Takahashi, Mikio Arakawa, Ryo Nakayama, Koichiro Tsujita

Proceedings Volume 7274, 72740Y (2009) https://doi.org/10.1117/12.813489

KEYWORDS: Scanners, Scanning electron microscopy, Photomasks, Optical lithography, Cadmium, Convolution, Polarization, Detection and tracking algorithms, Tolerancing, Manufacturing

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Proceedings Article | 16 March 2009 Paper

Paper

Advanced aberration control in projection optics for double patterning

Takashi Sukegawa, Tsuyoshi Kitamura, Toshiyuki Yoshihara, Tadashi Arai, Masatoshi Kobayashi, Kazuhiro Takahashi, Nobuhiko Yabu, Atsushi Shigenobu, Yasuo Hasegawa

Proceedings Volume 7274, 72741L (2009) https://doi.org/10.1117/12.813625

KEYWORDS: Projection systems, Double patterning technology, Monochromatic aberrations, Reticles, Polarization, Wavefront aberrations, Overlay metrology, Distortion, Laser induced plasma spectroscopy, Lithography

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Proceedings Article | 16 March 2009 Paper

Paper

Novel approaches to meet the requirements for double patterning

Hiroshi Morohoshi, Toshiyuki Yoshihara, Tadamasa Makiyama, Toshiyuki Kojima, Yoshio Kawanobe, Koichiro Tsujita, Kazuhiro Takahashi, Takeaki Ebihara

Proceedings Volume 7274, 72741J (2009) https://doi.org/10.1117/12.813585

KEYWORDS: Distortion, Semiconducting wafers, Overlay metrology, Double patterning technology, Critical dimension metrology, Control systems, Metrology, Etching, Data processing, Light sources

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Proceedings Article | 26 March 2007 Paper

Paper

Impact of illumination performance on hyper-NA imaging for 45-nm node

Ken-Ichiro Mori, Kazuhiro Takahashi, Takahisa Shiozawa, Akihiro Yamada

Proceedings Volume 6520, 652037 (2007) https://doi.org/10.1117/12.711862

KEYWORDS: Polarization, Light sources, Optical proximity correction, Critical dimension metrology, Lithographic illumination, Lithography, Projection systems, Light, Fiber optic illuminators, Birefringence

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Proceedings Article | 12 May 2005 Paper

Paper

RELAX: resolution enhancement by laser-spectrum adjusted exposure

Eric Kent, Alden Acheta, Nigel Farrar, Kazuhiro Takahashi, Harry Levinson, Daniel Colon, Koji Toyoda, German Rylov, Ivan Lalovic

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601002

KEYWORDS: Light sources, Resolution enhancement technologies, Lithography, Image processing, Excimer lasers, Deep ultraviolet, Wavefronts, Photomasks, Lithographic illumination, Colorimetry

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Proceedings Article | 12 May 2005 Paper

Paper

Development of ArF immersion exposure tool

Sunao Mori, Kazuhiro Takahashi, Hideo Hata, Keiko Chiba, Mikio Arakawa, Hitoshi Nakano, Tokuyuki Honda, Takahito Chibana

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600492

KEYWORDS: Semiconducting wafers, Water, Contamination, Control systems, Immersion lithography, Scanners, Transmittance, Temperature metrology, Optical lithography, Microfluidics

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Proceedings Article | 28 May 2004 Paper

Paper

Verification of compaction and rarefaction models for fused silica with 40 billion pulses of 193-nm excimer laser exposure and their effects on projection lens imaging performance

Yasuo Hasegawa, Hiroyuki Ishii, J. Martin Algots, William Partlo, Kazuhiro Takahashi, Richard Sandstrom

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537132

KEYWORDS: Silica, Data modeling, Wavefronts, Wavefront aberrations, Refractive index, Reticles, Statistical modeling, Performance modeling, Projection systems, Interferometry

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Proceedings Article | 30 July 2002 Paper

Paper

New-generation projection optics for ArF lithography

Yuji Chiba, Kazuhiro Takahashi

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474616

KEYWORDS: Lithography, Projection systems, Chemical elements, Binary data, Wavefronts, Scanners, Semiconductors, Photomasks, Crystals, Distortion

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Proceedings Article | 5 July 2000 Paper

Paper

Realization of very small aberration projection lenses

Toshiyuki Yoshihara, Ryo Koizumi, Shigeyuki Suda, Akiyoshi Suzuki, Kazuhiro Takahashi

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389045

KEYWORDS: Lenses, Wavefront aberrations, Manufacturing, Optics manufacturing, Monte Carlo methods, Lithography, Tolerancing, Chemical elements, Lens manufacturing, Optical components

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Proceedings Article | 5 July 2000 Paper

Paper

193-nm step-and-scan lithography equipment

Naoto Sano, Akiyoshi Suzuki, Kazuhiro Takahashi, Hitoshi Nakano

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389041

KEYWORDS: Lithography, Scanners, Semiconducting wafers, Projection systems, Excimer lasers, Lithographic illumination, Distortion, Optical alignment, Laser development, Light sources

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Proceedings Article | 29 June 1998 Paper

Paper

Imaging performance of scanning exposure systems

Kazunori Iwamoto, Hiroshi Itoh, Hiroaki Takeishi, Kazuhiro Takahashi, Masakatsu Ohta, Ryuichi Ebinuma, Mitsuru Inoue

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310772

KEYWORDS: Tin, Semiconducting wafers, Distortion, Imaging systems, Ions, Modulation transfer functions, Reticles, Projection systems, Fourier transforms, Computer simulations

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Proceedings Article | 3 November 1994 Paper

Paper

Subresolution artifacts optimized for use with Canon's CQUEST illumination system, and their cost effective realization using the Lepton EBES4 e-beam reticle generator

Akiyoshi Suzuki, C. Rose, Charles Biechler, David Walker, Kazuhiro Takahashi

Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191957

KEYWORDS: Reticles, X-ray technology, Leptons, Optics manufacturing, Photomasks, X-rays, Manufacturing, Raster graphics, Phase shifting, Printing

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Proceedings Article | 1 July 1991 Paper

Paper

New i-line lens for half-micron lithography

Masakatsu Ohta, Toshiyuki Kojima, Kazuhiro Takahashi, Miyoko Noguchi

Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44825

KEYWORDS: Distortion, Lithography, Optical lithography, Scanning electron microscopy, Photography, Glasses, Transmittance, Critical dimension metrology, Thermography, Iterated function systems

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Showing 5 of 17 publications

Conference Committee Involvement (10)

Optical Microlithography XXXI

27 February 2018 | San Jose, California, United States

Optical Microlithography XXX

28 February 2017 | San Jose, California, United States

Optical Microlithography XXIX

23 February 2016 | San Jose, California, United States

Optical Microlithography XXVIII

24 February 2015 | San Jose, California, United States

Optical Microlithography XXVII

25 February 2014 | San Jose, California, United States

Showing 5 of 10 Conference Committees

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