Mr. Kazuki Hagihara Profile

Kazuki Hagihara

Specialist at Kioxia Holdings Corp

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Author

Publications (11)

Proceedings Article | 26 October 2020 Presentation + Paper

Resist pattern inspection for defect reduction in sub-15 nm templates

Takeharu Motokawa, Machiko Suenaga, Kazuki Hagihara, Noriko Iida nee Sakurai, Ryu Komatsu, Hideaki Sakurai, Shingo Kanamitsu, Keisuke Tsuda, Tetsuo Harada, Takeo Watanabe

Proceedings Volume 11518, 115180H (2020) https://doi.org/10.1117/12.2572389

KEYWORDS: Inspection, Defect inspection, Scanning electron microscopy, Double patterning technology, Nanoimprint lithography, High volume manufacturing, Electron microscopes, Scatterometry, Microscopes, Coherence imaging

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Proceedings Article | 22 September 2020 Poster + Presentation

Measurement of cross-sectional profile for sub-15nm hp LS patterns in nanoimprint templates using small-angle x-ray scattering

Kazuki Hagihara, Eiji Yamanaka, Yoshiyasu Ito, Kiyoshi Ogata, Kazuhiko Omote, Naoya Hayashi

Proceedings Volume 11518, 1151810 (2020) https://doi.org/10.1117/12.2572462

KEYWORDS: Nanoimprint lithography, X-rays, Scattering, Scatter measurement, Quartz, Lithography, Semiconductors, Optical lithography, Semiconducting wafers, Photomasks

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Proceedings Article | 29 January 2020 Paper

Template development for sub15nm nanoimprint lithography

Ryota Seki, Akihiko Ando, Takeharu Motokawa, Machiko Suenaga, Noriko Iida nee Sakurai, Ryu Komatsu, Masato Naka, Rikiya Taniguchi, Syuichi Taniguchi, Kazuki Hagihara, Masato Saito, Hideaki Sakurai, Ryoji Yoshikawa, Eiji Yamanaka, Shingo Kanamitsu

Proceedings Volume 11178, 111780S (2020) https://doi.org/10.1117/12.2567043

KEYWORDS: Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Inspection, Scanning electron microscopy, Optical lithography, Etching, Lithography, Double patterning technology, Quartz

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Proceedings Article | 19 April 2019 Paper

Throughput improvement method for cross-sectional profile measurement of hole patterns in nanoimprint templates

Kazuki Hagihara, Rikiya Taniguchi, Eiji Yamanaka, Takashi Hirano, Kazuhiko Omote, Yoshiyasu Ito, Kiyoshi Ogata, Naoya Hayashi

Proceedings Volume 10810, 1081010 (2019) https://doi.org/10.1117/12.2503252

KEYWORDS: Nanoimprint lithography, X-rays, Quartz, Diffraction, Scattering, Nanostructures, Scanning electron microscopy, Time metrology, Transmission electron microscopy, X-ray detectors

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Proceedings Article | 16 October 2017 Presentation + Paper

The capability of measuring cross-sectional profile for hole patterns in nanoimprint templates using small-angle x-ray scattering

Kazuki Hagihara, Rikiya Taniguchi, Eiji Yamanaka, Kazuhiko Omote, Yoshiyasu Ito, Kiyoshi Ogata, Naoya Hayashi

Proceedings Volume 10451, 104510H (2017) https://doi.org/10.1117/12.2284761

KEYWORDS: X-rays, Nanoimprint lithography, Scattering, Quartz, 3D metrology, Critical dimension metrology, 3D acquisition, Scanning electron microscopy, Nanostructures, Ultraviolet radiation

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Proceedings Article | 13 July 2017 Paper

The capability of measuring cross-sectional profile for hole patterns in nanoimprint templates using small-angle x-ray scattering

Kazuki Hagihara, Rikiya Taniguchi, Eiji Yamanaka, Kazuhiko Omote, Yoshiyasu Ito, Kiyoshi Ogata, Naoya Hayashi

Proceedings Volume 10454, 104540Y (2017) https://doi.org/10.1117/12.2280686

KEYWORDS: Nanoimprint lithography, X-rays, Scattering, Quartz, 3D metrology, Scanning electron microscopy, Transmission electron microscopy, Nanostructures, Critical dimension metrology, 3D modeling

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Proceedings Article | 10 May 2016 Paper

High resolution hole patterning with EB lithography for NIL template production

Mana Tanabe, Keisuke Yagawa, Takeharu Motokawa, Kazuki Hagihara, Machiko Suenaga, Masato Saito, Shingo Kanamitsu, Masamitsu Itoh

Proceedings Volume 9984, 99840T (2016) https://doi.org/10.1117/12.2242363

KEYWORDS: Nanoimprint lithography, Optical lithography, Lithography, Dry etching, Image processing, Photoresist processing, Etching, Scanning electron microscopy, Semiconducting wafers, Vestigial sideband modulation

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Proceedings Article | 1 April 2016 Paper

Improvement of sub-20nm pattern quality with dose modulation technique for NIL template production

Keisuke Yagawa, Kunihiro Ugajin, Machiko Suenaga, Shingo Kanamitsu, Takeharu Motokawa, Kazuki Hagihara, Yukiyasu Arisawa, Sachiko Kobayashi, Masato Saito, Masamitsu Ito

Proceedings Volume 9777, 97771I (2016) https://doi.org/10.1117/12.2218809

KEYWORDS: Nanoimprint lithography, Lithography, Photomasks, Backscatter, Photoresist processing, Beam shaping, Solids, Data conversion, Semiconductors

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Proceedings Article | 28 July 2014 Paper

High performance mask fabrication process for the next-generation mask production

Keisuke Yagawa, Kunihiro Ugajin, Machiko Suenaga, Yoshihito Kobayashi, Takeharu Motokawa, Kazuki Hagihara, Masato Saito, Masamitsu Itoh

Proceedings Volume 9256, 925608 (2014) https://doi.org/10.1117/12.2069651

KEYWORDS: Photomasks, Optical lithography, Mask making, Photoresist processing, Lithography, Scanning electron microscopy, Beam shaping, Vestigial sideband modulation, Error analysis, Double patterning technology

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Proceedings Article | 9 September 2013 Paper

Potential of mask production process for finer pattern fabrication

Keisuke Yagawa, Kunihiro Ugajin, Machiko Suenaga, Yoshihito Kobayashi, Takeharu Motokawa, Kazuki Hagihara, Masato Saito, Masamitsu Itoh

Proceedings Volume 8880, 88802N (2013) https://doi.org/10.1117/12.2033257

KEYWORDS: Photomasks, Vestigial sideband modulation, Extreme ultraviolet, Lithography, Nanoimprint lithography, Scanning electron microscopy, Extreme ultraviolet lithography, Image analysis, Optical design, Optical lithography

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Proceedings Article | 11 May 2009 Paper

Study of CD variation at EUV mask fabrication occurred by electric conduction from top to back side

Kosuke Takai, Koji Murano, Kazuki Hagihara, Masamitsu Itoh, Tsukasa Abe, Takashi Adachi, Hideo Akizuki, Tadahiko Takikawa, Hiroshi Mohri, Naoya Hayashi

Proceedings Volume 7379, 73792I (2009) https://doi.org/10.1117/12.824332

KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Coating, Extreme ultraviolet lithography, Mask making, Conductive coatings, Critical dimension metrology, Photoresist processing, Ions

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Showing 5 of 11 publications

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