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Kazuko Jochi
at KLA Japan
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 30 October 2007 Paper
EUV mask process development using DUV inspection system
Ki Hun Park, William Huang, Kazuko Jochi, Paul Yu, Yumiko Maenaka, Andrew Cao, Gregg Inderhees, Venu Vellanki, Aditya Dayal, David Kim, Chunlin Chen
Proceedings Volume 6730, 67305M (2007) https://doi.org/10.1117/12.747163
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Cameras, Deep ultraviolet, Lithography, Etching, Reticles, Fiber optic illuminators
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