Dr. Kazumitsu Nakamura
Senior Researcher/Eng. at Hitachi High-Tech Taiwan Corp
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Reticles, Manufacturing, Computing systems, Control systems, LCDs, Computer aided design, Data conversion, Semiconducting wafers, Optics manufacturing, Edge roughness

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Lithography, Light sources, Reticles, Opacity, Polarizers, LCDs, Projection systems, Transmittance, Semiconducting wafers, LCD projection

Proceedings Article | 27 December 1996 Paper
Proc. SPIE. 2884, 16th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Wafer-level optics, Oxides, Lithography, Electron beam lithography, Etching, Silicon, Photomasks, Plasma etching, Semiconducting wafers, Plasma

Proceedings Article | 27 May 1996 Paper
Proc. SPIE. 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI
KEYWORDS: Oxides, Lithography, Electron beam lithography, Etching, Silicon, Photomasks, Optical alignment, Photoresist processing, Plasma, Chemically amplified resists

Proceedings Article | 8 December 1995 Paper
Proc. SPIE. 2621, 15th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Electron beam lithography, Metrology, Gallium arsenide, Inspection, Chromium, Atomic force microscopy, Quantum dots, Scanning electron microscopy, Photomasks, Nanofabrication

Showing 5 of 8 publications
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