Mr. Kazuo Sakamoto Profile

Kazuo Sakamoto

Assistant Manager at Tokyo Electron Kyushu Ltd

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Author

Publications (16)

Proceedings Article | 9 April 2024 Presentation + Paper

Dissolution dynamics of copolymer of poly(4-hydroxystyrene-co-methacrylic acid) in tetraalkylammonium hydroxide aqueous solutions

Yutaro Iwashige, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Proceedings Volume 12957, 129570D (2024) https://doi.org/10.1117/12.3011199

KEYWORDS: Copolymers, Stochastic processes, Lithography, Line width roughness, Semiconductors, Photoresist processing, Materials processing, Extreme ultraviolet lithography, Polymers

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Proceedings Article | 21 November 2023 Presentation + Paper

Analysis of dissolution modes of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions using decision trees and support vector machine

Hitomi Betsumiya, Yuqing Jin, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Proceedings Volume 12750, 127500J (2023) https://doi.org/10.1117/12.2687340

KEYWORDS: Decision trees, Support vector machines, Polymers, Machine learning, Viscosity, Polymer thin films, Materials properties, Film thickness

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Proceedings Article | 1 May 2023 Presentation + Paper

Effects of photoacid generator decomposition on dissolution kinetics of poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions

Yutaro Iwashige, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Proceedings Volume 12498, 124980I (2023) https://doi.org/10.1117/12.2658138

KEYWORDS: Ultraviolet radiation, Photoacid generators, Stochastic processes, Line width roughness, Semiconductors, Photoresist processing, Materials processing, Lithography

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Proceedings Article | 1 May 2023 Poster + Paper

Dependence of swelling and dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution on alkyl chain length of tetraalkylammonium hydroxide

Hitomi Betsumiya, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Proceedings Volume 12498, 1249829 (2023) https://doi.org/10.1117/12.2670175

KEYWORDS: Polymers, Photoresist processing, Extreme ultraviolet lithography, Miniaturization, Film thickness, Chemically amplified resists

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Proceedings Article | 25 May 2022 Presentation + Paper

Swelling and dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution studied by quartz crystal microbalance (QCM) method

Yuko Tsutsui Ito, Hitomi Betsumiya, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu

Proceedings Volume 12055, 1205509 (2022) https://doi.org/10.1117/12.2612781

KEYWORDS: Polymers, Quartz, Crystals, Standards development, Molecules, Chemically amplified resists, Image processing, Extreme ultraviolet lithography, Semiconductors, Photoresist processing

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Proceedings Article | 31 December 2008 Paper

Evaluation of the crack growth characteristics of glass and ceramics based on crack length measurement using an ion-sputtered film

G. Deng, K. Sakamoto, K. Ikeda, T. Nakanishi

Proceedings Volume 7130, 713003 (2008) https://doi.org/10.1117/12.819538

KEYWORDS: Ceramics, Soda-lime glass, Glasses, Resistance, Metals, Finite element methods, Precision measurement, Microscopes, Diamond, Gold

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Proceedings Article | 29 April 2004 Paper

CD error budget analysis in ArF lithography

Takahisa Otsuka, Kazuo Sakamoto

Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.534582

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Line width roughness, Error analysis, Diamond patterning, Lithography, Scanning electron microscopy, Photomasks, Photoresist processing, Electron beams

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Proceedings Article | 28 August 2003 Paper

New development method eliminating the loading and microloading effect

Kotaro Ooishi, Yukihiko Esaki, Kazuo Sakamoto, Hideaki Sakurai, Masamitsu Itoh, Mika Nakao, Toshiharu Nishimura, Hiroyuki Miyashita, Naoya Hayashi, Shinji Tanabe, Yoshihisa Oosaki, Yasuyoshi Sasagawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504050

KEYWORDS: Photomasks, Particles, Critical dimension metrology, Control systems, Printing, Electronics, Sensors, Fluctuations and noise, Humidity

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Proceedings Article | 12 June 2003 Paper

Novel development method to improve critical dimensional control

Akira Nishiya, Kazuo Sakamoto

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485059

KEYWORDS: Standards development, Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Semiconductor manufacturing, Semiconductors, Manufacturing, Photoresist processing, Electroluminescence, Image processing

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Proceedings Article | 27 December 2002 Paper

Novel resist development system for photomasks

Masamitsu Itoh, Hideaki Sakurai, Yukihiko Esaki, Kotaro Ooishi, Kazuo Sakamoto

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467260

KEYWORDS: Photoresist processing, Photomasks, Sensors, Cadmium sulfide, Critical dimension metrology, Chemically amplified resists, Etching, Microfluidics, Photomask technology, Plasma etching

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Proceedings Article | 27 December 2002 Paper

Performance of proximity gap suction development (PGSD)

Hideaki Sakurai, Masamitsu Itoh, Yukihiko Esaki, Kotaro Ooishi, Kazuo Sakamoto, Mika Nakao, Toshiharu Nishimura, Hiroyuki Miyashita, Naoya Hayashi

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467297

KEYWORDS: Critical dimension metrology, Photomasks, Cadmium, Mask making, Photoresist processing, Printing, Process engineering, Manufacturing, Semiconductor manufacturing, Semiconductors

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Proceedings Article | 24 July 2002 Paper

Novel development method for CD control: optimized spin-off development method

Kazuo Sakamoto, Akira Nishiya, Kentarou Yamamura, Takahisa Otsuka

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474279

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Cadmium, Diffusion, Liquids, Optical lithography, Deep ultraviolet, Lead

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Proceedings Article | 24 August 2001 Paper

Novel develop application method to improve critical dimension control

Kazuo Sakamoto

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436889

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Cadmium sulfide, Wavefronts, Chemically amplified resists, Astatine, Arsenic, Deep ultraviolet, Manufacturing

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When using KrF resists, a peculiarity in critical dimensions (CDs) called developer nozzle traces is often observed (figure 2). We have determined and solved the cause of this problem. We calculated the flow rate of the developer solution per unit area at various points on a wafer, which was dispensed using a conventional nozzle (Figure 1). We discovered that the flow rate per unit area varied significantly across a wafer. We determined that areas of the wafer getting high developer flow rates had narrower CDs than other areas. We concluded that the cause of developer nozzle traces was due to a flow rate imbalance. We examined in detail the correlation between the amount of developer solution dispensed on a wafer and the line width, and found that the line width was narrowed when the amount of developer dispensed was 0.4 ml/cm² or greater (Shipley UV6) (figure 7). From this result, it appears that the nozzle traces are related to the distribution of flow rate and that of CD. In addition, the profile of the top of the pattern differs depending on the developer flow rate. At high rates, the profile becomes rounded while at lower rates the profile is rectangular. Taking all of these observations into consideration, we invented a nozzle that dispenses developer uniformly over an entire wafer. The opening of this nozzle is slit-like in shape and extends over the entire wafer diameter. For full puddle formation, the nozzle dispenses developer solution while scanning linearly across a wafer. The wafer is stationary and does not rotate during this process. This nozzle system dispenses a uniform volume of developer per unit area over an entire wafer (figure 10). In order to achieve good puddling, developer dispense rate and nozzle scan rate have been optimized to minimize the movement of developer solution. At this time, the amount of developer dispensed over the wafer surface was 0.2 ml/cm². We evaluated CD measurements using this nozzle and obtained very slight CD variation within a wafer 3 sigma = 6nm 180nm L/S (figure 14). Finally we found out that making the dispense flow rate of the developer solution equal and low per unit area is critical for CD control. By reducing the flow rate of the developer, the profile of the feature becomes rectangular compared to when using a conventional nozzle (figure 13).

Proceedings Article | 14 September 1994 Paper

Polarization maintaining properties of the flint glass fiber for the Faraday sensor element

Kiyoshi Kurosawa, Satoru Yoshida, Kazuo Sakamoto

Proceedings Volume 2360, (1994) https://doi.org/10.1117/12.185065

KEYWORDS: Polarization, Flint glass, Birefringence, Sensors, Refractive index, Optical testing, Mineralogy, Glasses, Fiber optics sensors, Cobalt

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Proceedings Article | 14 September 1994 Paper

Method for improvement of immunity from environment in Faraday-effect current sensor using the flint glass fiber

Kiyoshi Kurosawa, Satoru Yoshida, Kazuo Sakamoto

Proceedings Volume 2360, (1994) https://doi.org/10.1117/12.185093

KEYWORDS: Flint glass, Sensors, Environmental sensing, Mirrors, Modulation, Signal detection, Polarization, Dielectric polarization, Fiber optics sensors, Refractive index

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Proceedings Article | 14 September 1994 Paper

Optical fibre-type current sensor utilizing the Faraday effect of the flint glass fibre

Kiyoshi Kurosawa, Satoru Yoshida, Kazuo Sakamoto, Isao Masuda, Teruo Yamashita

Proceedings Volume 2360, (1994) https://doi.org/10.1117/12.185054

KEYWORDS: Flint glass, Polarization, Sensors, Optical fibers, Signal processing, Light, Polarizers, Sensing systems, Wave plates, Fiber optics sensors

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Showing 5 of 16 publications

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