Dr. Kehan Tian
at IBM Corp
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 13 March 2012 Paper
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Diffraction, Spatial frequencies, Metals, Image quality, Source mask optimization, Optical proximity correction, SRAF, Modulation transfer functions, Resolution enhancement technologies

Proceedings Article | 5 April 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Photovoltaics, Diffraction, Visualization, Photomasks, Source mask optimization, Algorithm development, Standards development, Resolution enhancement technologies

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Optical lithography, Image processing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers, Tolerancing, Resolution enhancement technologies

Proceedings Article | 14 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Nanotechnology, Lithography, Mirrors, Environmental monitoring, Diffractive optical elements, Glasses, Scanners, Manufacturing, Optical proximity correction, Fiber optic illuminators

Proceedings Article | 16 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffractive optical elements, Metals, Scanning electron microscopy, Photomasks, Source mask optimization, Optical proximity correction, Line edge roughness, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 14 publications
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