Keiichiro Hitomi
at Hitachi America Ltd
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

SPIE Journal Paper | 12 October 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Electron microscopes, Extreme ultraviolet lithography, Electron beams, Image processing, Double patterning technology, Solids, Precision measurement

SPIE Journal Paper | 19 July 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Optical proximity correction, Data modeling, Critical dimension metrology, Optical calibration, Scanning electron microscopy, Hybrid optics, Metals, Calibration, Instrument modeling, OLE for process control

Proceedings Article | 31 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Calibration, Data modeling, Cadmium sulfide, Optical proximity correction, Scanning electron microscopy, Statistical modeling, Finite element methods, Semiconducting wafers, Front end of line, Optical lithography

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Extreme ultraviolet, Electron beams, Extreme ultraviolet lithography, Scanning electron microscopy, Precision measurement, Metrology, Image processing, Optical testing, Error analysis, Electron microscopes

Showing 5 of 10 publications
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