Dr. Keisuke Yamaguchi Profile

Dr. Keisuke Yamaguchi

at NuFlare Technology Inc

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 1 May 2023 Presentation + Paper

Current performance and future plans on electron multi-beam mask writers toward high-NA EUV era

Hiroshi Matsumoto, Haruyuki Nomura, Hayato Kimura, Keisuke Yamaguchi, Yoshinori Kojima, Masato Saito, Takao Tamura, Noriaki Nakayamada

Proceedings Volume 12497, 1249708 (2023) https://doi.org/10.1117/12.2657994

KEYWORDS: Manufacturing, Extreme ultraviolet, Data conversion, Control systems, Microelectromechanical systems, Photomasks, Electron beam lithography

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Proceedings Article | 11 November 2022 Presentation

Selective leading-edge mask writing and high-throughput mask writing in multi-beam mask writer MBM-2000PLUS

Haruyuki Nomura, Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Noriaki Nakayamada

Proceedings Volume PC12293, PC122930I (2022) https://doi.org/10.1117/12.2641449

KEYWORDS: Photomasks, Glasses, Semiconductors, Physical phenomena, Optical lithography, Mask making, Line edge roughness, Extreme ultraviolet lithography, Error analysis, Edge roughness

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Proceedings Article | 16 September 2022 Paper

Multi-beam mask writer MBM-2000PLUS

Haruyuki Nomura, Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Satoshi Nakahashi, Noriaki Nakayamada

Proceedings Volume 12325, 123250O (2022) https://doi.org/10.1117/12.2641338

KEYWORDS: Photomasks, Line edge roughness, Mask making, Metrology, Data conversion, Convolution, Data processing

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Proceedings Article | 25 May 2022 Presentation + Paper

Multi-beam mask writer MBM-2000PLUS

Haruyuki Nomura, Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Satoshi Nakahashi, Nariaki Nakayamada

Proceedings Volume 12054, 1205408 (2022) https://doi.org/10.1117/12.2616664

KEYWORDS: Photomasks, Line edge roughness, Mask making, Data conversion, Data processing

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SPIE Journal Paper | 9 November 2021

Study on physical model of resist surface charge in multi-beam mask writer and single variable-shaped beam writers

Haruyuki Nomura, Noriaki Nakayamada, Hayato Kimura, Keisuke Yamaguchi, Takanao Touya, Kazuhiro Kishi, Yasunori Hatanaka, Kenji Ohtoshi

JM3, Vol. 20, Issue 04, 041404, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041404

KEYWORDS: Electron beam melting, Photomasks, Electron beams, Diffusion, Differential equations, Metrology, Glasses, Polymethylmethacrylate, Optical simulations, Statistical analysis

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Proceedings Article | 1 October 2021 Presentation

Multi-beam mask writer MBM-2000

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Noriaki Nakayamada

Proceedings Volume 11855, 118550W (2021) https://doi.org/10.1117/12.2600904

KEYWORDS: Photomasks, Optical design, Distortion, Data processing, Scattering, Photoresist processing, Modulation, Laser scattering, Glasses, Forward error correction

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Proceedings Article | 23 August 2021 Paper

Multi-beam mask writer, MBM-2000

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Noriaki Nakayamada

Proceedings Volume 11908, 119080L (2021) https://doi.org/10.1117/12.2604378

KEYWORDS: Photomasks, Thermal effects, Modulation, Vestigial sideband modulation, Forward error correction, Extreme ultraviolet lithography, Thin film coatings, Semiconductors, Semiconducting wafers, Error analysis

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Proceedings Article | 24 February 2021 Presentation

Multi-beam mask writer MBM-2000 (Conference Presentation)

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Noriaki Nakayamada

Proceedings Volume 11610, 116100Y (2021) https://doi.org/10.1117/12.2586288

KEYWORDS: Photomasks, Optical design, Distortion, Data processing, Scattering, Photoresist processing, Modulation, Laser scattering, Glasses, Forward error correction

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Proceedings Article | 20 September 2020 Presentation

Multi-beam mask writer MBM-2000

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Kenichi Yasui

Proceedings Volume 11518, 115180A (2020) https://doi.org/10.1117/12.2573147

KEYWORDS: Optical design, Electron beam lithography, Scattering, Distortion, Vestigial sideband modulation, Optical proximity correction, Forward error correction, Laser scattering, Extreme ultraviolet, Photoresist processing

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Showing 5 of 9 publications

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