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Ken Yang
at ASML
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Publications (1)
Proceedings Article | 28 April 2023 Presentation + Paper
A holistic approach to model-based stochastic-aware computational lithography
ChangAn Wang, Yongfa Fan, Mu Feng, Qian Xie, Jazer Wang, Chris Kaplan, Michael Crouse, Xiaoyang Li, Stephen Hsu, Peigen Cao, Yi-Hsing Peng, Stephen Chang, Jun Ye, Youping Zhang, Bin Cheng, Ken Yang, Leiwu Zheng, Jen-Shiang Wang, Austin Peng, Li-Hao Yeh, Cuiping Zhang, Rafael Howell, Alexander Tan, Yiqiong Zhao, Jun Lang, Xiaolong Zhang
Proceedings Volume 12494, 124940B (2023) https://doi.org/10.1117/12.2658508
KEYWORDS: Stochastic processes, Data modeling, Optical proximity correction, Line width roughness, Source mask optimization, Computational lithography, Semiconducting wafers, Modeling, Performance modeling, Photons
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