Kenichi Takenouchi
at Hitachi High-Tech America Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Scanning electron microscopy, Metrology, Optical alignment, Edge detection, Objectives, Local area networks, Silicon, Modulation, Semiconductor manufacturing, Environmental monitoring

Proceedings Article | 10 May 2005 Paper
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Video, Semiconducting wafers, Scanning electron microscopy, Video compression, Image resolution, RGB color model, Image compression, Prototyping, Error analysis, Semiconductor manufacturing

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