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Kevin B. Edwards
Application Engineer at Brewer Science Inc
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Publications (4)
Proceedings Article | 1 April 2008 Paper
Reflection control in hyper-NA immersion lithography
Proceedings Volume 6924, 69244A (2008) https://doi.org/10.1117/12.772899
KEYWORDS: Reflectivity, Ultraviolet radiation, Reflection, Phase shifts, Critical dimension metrology, Fused deposition modeling, Lithography, Diffraction, UV optics, Diffusion
Proceedings Article | 2 April 2007 Paper
Materials for and performance of multilayer lithography schemes
Proceedings Volume 6519, 65192S (2007) https://doi.org/10.1117/12.712342
KEYWORDS: Reflectivity, Silicon, Lithography, System on a chip, Etching, Multilayers, Photomasks, Semiconducting wafers, Plasma etching, Plasma
Proceedings Article | 11 April 2006 Paper
Wet-recess process optimization of a developer-soluble gap-fill material for planarization of trenches in trench-first dual damascene process
Carlton Washburn, Nick Brakensiek, Alice Guerrero, Kevin Edwards, Charlyn Stroud, Nicki Chapman
Proceedings Volume 6153, 61532K (2006) https://doi.org/10.1117/12.655734
KEYWORDS: Semiconducting wafers, Etching, Copper, Photoresist processing, Dielectrics, Semiconductor manufacturing, Coating, Silicon, Wet etching, Optical lithography
Proceedings Article | 14 May 2004 Paper
Developer-soluble gap fill materials for patterning metal trenches in via-first dual damascene process
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534338
KEYWORDS: Semiconducting wafers, Etching, Lithography, Standards development, Reactive ion etching, Optical lithography, Metals, Polymers, Photoresist materials, Materials processing
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