Kevin B. Edwards
Application Engineer at Brewer Science Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 1 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Reflectivity, Ultraviolet radiation, Reflection, Phase shifts, Critical dimension metrology, Fused deposition modeling, Lithography, Diffraction, UV optics, Diffusion

Proceedings Article | 2 April 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Reflectivity, Silicon, Lithography, System on a chip, Etching, Multilayers, Photomasks, Semiconducting wafers, Plasma etching, Plasma

Proceedings Article | 11 April 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconducting wafers, Etching, Copper, Photoresist processing, Dielectrics, Semiconductor manufacturing, Coating, Silicon, Wet etching, Optical lithography

Proceedings Article | 14 May 2004 Paper
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Semiconducting wafers, Etching, Lithography, Standards development, Reactive ion etching, Optical lithography, Metals, Polymers, Photoresist materials, Materials processing

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