Dr. Kevin M. Monahan Profile

Dr. Kevin M. Monahan

CEO/Owner at Quantgain Strategies LLC

SPIE Involvement:

Author

Publications (30)

Proceedings Article | 5 April 2012 Paper

Multiple column high-throughput e-beam inspection (EBI)

David Lam, Kevin Monahan, Enden Liu, Cong Tran, Ted Prescop

Proceedings Volume 8324, 83240G (2012) https://doi.org/10.1117/12.927032

KEYWORDS: Inspection, Semiconducting wafers, Defect detection, Wafer inspection, Magnetism, Scanning electron microscopy, Sensors, Scanners, Defect inspection, Data storage

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Proceedings Article | 5 April 2007 Paper

Enabling immersion lithography and double patterning

Kevin Monahan, Amir Widmann

Proceedings Volume 6518, 65181M (2007) https://doi.org/10.1117/12.714204

KEYWORDS: Overlay metrology, Double patterning technology, Immersion lithography, Etching, Semiconducting wafers, Lithography, Metrology, Critical dimension metrology, Scatterometry, Single crystal X-ray diffraction

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Proceedings Article | 24 March 2006 Paper

Enabling DFM and APC strategies with advanced process metrics

Kevin Monahan, Umar Whitney

Proceedings Volume 6152, 61521E (2006) https://doi.org/10.1117/12.655894

KEYWORDS: Metrology, Design for manufacturing, Scanning electron microscopy, Single crystal X-ray diffraction, Overlay metrology, Dielectrics, Critical dimension metrology, Data modeling, Calibration, Lithography

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Proceedings Article | 10 May 2005 Paper

Cost effective CD control for DUV implant layers using the Archer MPX focus-exposure monitor

Sean Hannon, Brad Eichelberger, Chris Nelson, Berta Dinu, Harold Kennemer, Kevin Monahan

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600130

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Metrology, Finite element methods, Scanners, Overlay metrology, Data modeling, Nano opto mechanical systems, Standards development

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Proceedings Article | 5 May 2005 Paper

Design and process limited yield at the 65-nm node and beyond

Kevin Monahan, Brian Trafas

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.605369

KEYWORDS: Design for manufacturing, Critical dimension metrology, Process control, Metrology, Overlay metrology, Single crystal X-ray diffraction, Line width roughness, Data modeling, Immersion lithography, Lithography

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Proceedings Article | 24 May 2004 Paper

Effect of inline dose and focus monitoring and control on post-etch CD

Berta Dinu, Venkatram Subramony, Pei Chin Lim, Dawn Goh, Brad Eichelberger, Kwong Boo Chew, Kevin Monahan

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535241

KEYWORDS: Semiconducting wafers, Etching, Critical dimension metrology, Data modeling, Standards development, Lithography, Process control, Finite element methods, Optical testing, Optical lithography

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Proceedings Article | 24 May 2004 Paper

Edge die focus-exposure monitoring and compensation to improve CD distributions

Brad Eichelberger, Venkatram Subramony, Augustine Chew, Berta Dinu, Dawn Goh, Pei Chin Lim, Kevin Monahan

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535196

KEYWORDS: Semiconducting wafers, Etching, Scanners, Metrology, Yield improvement, Overlay metrology, Finite element methods, Critical dimension metrology, Scanning electron microscopy, Wafer-level optics

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Proceedings Article | 29 April 2004 Paper

Yield loss in lithographic patterning at the 65nm node and beyond

Kevin Monahan, Brad Eichelberger, Matt Hankinson, John Robinson, Mike Slessor

Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.537349

KEYWORDS: Critical dimension metrology, Lithography, Semiconducting wafers, Process control, Spectroscopic ellipsometry, Metrology, Manufacturing, Overlay metrology, Photomasks, Resolution enhancement technologies

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Proceedings Article | 2 July 2003 Paper

Microeconomics of process control in semiconductor manufacturing

Kevin Monahan

Proceedings Volume 5043, (2003) https://doi.org/10.1117/12.487631

KEYWORDS: Critical dimension metrology, Process control, Semiconducting wafers, Metrology, Manufacturing, Process modeling, Lithography, Etching, Control systems, Semiconductor manufacturing

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Proceedings Article | 2 July 2003 Paper

Microeconomics of yield learning in semiconductor manufacturing

Kevin Monahan

Proceedings Volume 5043, (2003) https://doi.org/10.1117/12.485288

KEYWORDS: Metrology, Semiconducting wafers, Overlay metrology, Critical dimension metrology, Inspection, Lithography, Yield improvement, Process control, Semiconductor manufacturing, Manufacturing

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Proceedings Article | 2 June 2003 Paper

Overlay excursion management through sample plan optimization and cycle time reduction

Xuemei Chen, Ming-Yeon Hung, Kelly Kuo, Steven Fu, Geoge Shanthikumar, Zhoujie Mao, Shiming Deng, Viral Hazari, Kevin Monahan, Mike Slessor, Amir Lev

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485043

KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Time metrology, Error analysis, Statistical analysis, Process control, Lithography, Yield improvement, Scanners

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Proceedings Article | 16 July 2002 Paper

Microeconomics of advanced process window control for 50-nm gates

Kevin Monahan, Xuemei Chen, Georges Falessi, Craig Garvin, Matt Hankinson, Amir Lev, Ady Levy, Michael Slessor

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473503

KEYWORDS: Semiconducting wafers, Process control, Manufacturing, Information operations, Critical dimension metrology, Process modeling, Metrology, Etching, Lithography, Adaptive optics

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Proceedings Article | 22 August 2001 Paper

Microeconomics of 300-mm process module control

Kevin Monahan, Arun Chatterjee, Georges Falessi, Ady Levy, Meryl Stoller

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436774

KEYWORDS: Metrology, Semiconducting wafers, Process control, Critical dimension metrology, Overlay metrology, Yield improvement, Lithography, Inspection, Manufacturing, Data modeling

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Proceedings Article | 2 June 2000 Paper

Accelerated yield learning in agressive lithography

Kevin Monahan, Scott Ashkenaz, Xing Chen, Patrick Lord, Mark Merrill, Rich Quattrini, James Wiley

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386505

KEYWORDS: Metrology, Semiconducting wafers, Lithography, Critical dimension metrology, Process control, Overlay metrology, Yield improvement, Inspection, Manufacturing, Information operations

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Proceedings Article | 2 June 2000 Paper

Defects and metrology of ultrathin resist films

Uzodinma Okoroanyanwu, Jonathan Cobb, Paul Dentinger, Craig Henderson, Veena Rao, Kevin Monahan, David Luo, Christopher Pike

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386506

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Particles, Confocal microscopy, Coating, Metrology, Microscopes, Polymers, Defect detection, Air contamination

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Proceedings Article | 14 June 1999 Paper

Application of model-based lithographic process control for cost-effective IC manufacturing at 0.13 um and beyond

Kevin Monahan, Patrick Lord, Clive Hayzelden, Waiman Ng

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350830

KEYWORDS: Lithography, Semiconducting wafers, Reticles, Overlay metrology, Critical dimension metrology, Model-based design, Manufacturing, Process control, Process modeling, Photomasks

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Proceedings Article | 8 June 1998 Paper

Subnanometer-precision metrology for 100-nm gate linewidth control

Kevin Monahan, Craig MacNaughton, Waiman Ng, Herschel Marchman, Jerry Schlesinger

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308721

KEYWORDS: Critical dimension metrology, Line scan image sensors, Scanning electron microscopy, Process control, Metrology, Semiconducting wafers, Contamination, Semiconductor manufacturing, Control systems, Error analysis

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Proceedings Article | 7 July 1997 Paper

Application of statistical metrology to reduce total uncertainty in the CD SEM measurement of across-chip linewidth variation

Kevin Monahan, Randy Forcier, Waiman Ng, Suresh Kudallur, Harry Sewell, Herschel Marchman, Jerry Schlesinger

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275907

KEYWORDS: Scanning electron microscopy, Metrology, Lithography, Semiconducting wafers, Critical dimension metrology, Error analysis, Signal processing, Digital signal processing, Transistors, Deep ultraviolet

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Proceedings Article | 21 May 1996 Paper

Benchmarking multimode CD-SEM metrology to 180 nm

Kevin Monahan, Farid Askary, Richard Elliott, Randy Forcier, Rich Quattrini, Brian Sheumaker, Jason Yee, Herschel Marchman, Robert Bennett, Steven Carlson, Harry Sewell, Diane McCafferty, Javed Sumra, Jane Yan

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240105

KEYWORDS: Scanning electron microscopy, Metrology, Semiconducting wafers, Lithography, Reticles, Deep ultraviolet, Atomic force microscopy, Critical dimension metrology, Silicon, Calibration

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Proceedings Article | 22 May 1995 Paper

Multimode electron beam imaging and metrology

Kevin Monahan

Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209217

KEYWORDS: Semiconducting wafers, Metrology, Scanning electron microscopy, Process control, Critical dimension metrology, Electron beams, Image processing, Deep ultraviolet, Image resolution, Photoresist materials

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Proceedings Article | 1 July 1994 Paper

Benchmark procedures for CD measurement system evaluation

Kevin Monahan

Proceedings Volume 10274, 1027403 (1994) https://doi.org/10.1117/12.187460

KEYWORDS: Critical dimension metrology, Process engineering, Semiconductors

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Proceedings Article | 1 May 1994 Paper

Low-loss electron imaging and its application to critical dimension metrology

Kevin Monahan, M. Davidson, Zofia Grycz, Royce Krieger, B. Scheumaker, Robert Zmrzli

Proceedings Volume 2196, (1994) https://doi.org/10.1117/12.174122

KEYWORDS: Critical dimension metrology, Inspection, Integrated circuits, Image resolution, Monte Carlo methods, Process control

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Proceedings Article | 4 August 1993 Paper

New low-voltage SEM technology for imaging and metrology of submicrometer contact holes and other high-aspect-ratio structures

Kevin Monahan, Guillermo Toro-Lira, Mark Davidson

Proceedings Volume 1926, (1993) https://doi.org/10.1117/12.148952

KEYWORDS: Silicon, Monte Carlo methods, Scanning electron microscopy, Metrology, Oxides, Signal detection, Sensors, Scattering, Image resolution, Confocal microscopy

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Proceedings Article | 1 June 1992 Paper

Application of statistical models to decomposition of systematic and random error in low-voltage SEM metrology

Kevin Monahan, Sadri Khalessi

Proceedings Volume 1673, (1992) https://doi.org/10.1117/12.59783

KEYWORDS: Error analysis, Oxides, Metrology, Data modeling, Statistical analysis, Imaging systems, Scanning electron microscopy, Inspection, Process control, Electron beams

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Proceedings Article | 1 June 1992 Paper

Simulation of linearity in optical microscopes

Mark Davidson, Kevin Monahan

Proceedings Volume 1673, (1992) https://doi.org/10.1117/12.59789

KEYWORDS: Microscopes, Computer simulations, Optical metrology, Metrology, Optical microscopes, Confocal microscopy, Coherence (optics), Silicon, Optical testing, Integrated circuits

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Proceedings Article | 1 July 1991 Paper

Using the Atomic Force Microscope to measure submicron dimensions of integrated circuit devices and processes

Mark Rodgers, Kevin Monahan

Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44448

KEYWORDS: Atomic force microscopy, Integrated circuits, Photomasks, Inspection, Scanners, Image processing, Photoresist materials, Metrology, Process control, Atomic force microscope

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Proceedings Article | 1 July 1991 Paper

Linearity of coherence probe metrology: simulation and experiment

Mark Davidson, Kevin Monahan, Robert Monteverde

Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44432

KEYWORDS: Metrology, Microscopes, Process control, Integrated circuits, Inspection, Device simulation, Confocal microscopy, Mirrors, Scattering, Coherence (optics)

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Proceedings Article | 1 July 1991 Paper

Charging effects in low-voltage SEM metrology

Kevin Monahan, Jozef Benschop, Tom Harris

Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44419

KEYWORDS: Electrons, Line scan image sensors, Metrology, Scanning electron microscopy, Photoresist materials, Silicon, Distortion, Integrated circuits, Inspection, Process control

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Proceedings Article | 1 July 1991 Paper

High-speed stepper setup using a low-voltage SEM

Jozef Benschop, Kevin Monahan, Tom Harris

Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44424

KEYWORDS: Scanning electron microscopy, Silicon, Metrology, Data modeling, Integrated circuits, Inspection, Process control, Chlorine, Affine motion model, Matrices

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Proceedings Article | 1 June 1990 Paper

Object contrast in the confocal microscope and applications to lithographic metrology

Kevin Monahan, Jozef Benschop

Proceedings Volume 1261, (1990) https://doi.org/10.1117/12.20034

KEYWORDS: Confocal microscopy, Scanning electron microscopy, Microscopes, Metrology, Photoresist materials, Silicon, Integrated circuits, Inspection, Process control, Lithographic metrology

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