Dr. Kew-Chan Shim Profile

Dr. Kew-Chan Shim

at Hynix Semiconductor Inc

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 21 March 2007 Paper

New ArF resist introduction for process through-put enhancement

Myoung Soo Kim, Hae-Wook Ryu, Hong-Goo Lee, Hak-Joon Kim, Kew-Chan Shim, Myung-Goon Gil, Hyo-Sang Kang

Proceedings Volume 6519, 65193G (2007) https://doi.org/10.1117/12.711022

KEYWORDS: Line edge roughness, Optical lithography, Photoresist processing, Instrument modeling, Reliability, Semiconducting wafers, Industrial chemicals, Semiconductors, Scanning electron microscopy, Aerospace engineering

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Proceedings Article | 29 March 2006 Paper

Implantation blocking characteristics study of organic BARC materials

Myoung-Soo Kim, Jae-Wook Seo, Kew-Chan Shim, Seung-Woo Jin, Hak-Joon Kim, Myung-Goon Gil, Yong-Wook Song

Proceedings Volume 6153, 61532N (2006) https://doi.org/10.1117/12.657317

KEYWORDS: Etching, Coating, Semiconducting wafers, Boron, Chemical analysis, Chromophores, Reflectivity, Silicon, Control systems, Ions

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Proceedings Article | 4 May 2005 Paper

Optimization of 248nm bottom anti-reflective coatings with thin film and high etch rate on real device

MyoungSoo Kim, HakJoon Kim, KewChan Shim, JeHa Jeon, MyungGoon Gil, YongWook Song, Tomoyuki Enomoto, Takahiro Sakaguchi, Yasuyuki Nakajima

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599434

KEYWORDS: Reflectivity, Photoresist materials, Silicon, Etching, Semiconducting wafers, Coating, Oxides, Thin films, Plasma etching, Semiconductors

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Proceedings Article | 14 May 2004 Paper

Application of new thin BARC technology for KrF lithography at 80-nm node device

Myoung-Soo Kim, Kew-Chan Shim, Hak-Joon Kim, Ki-Sung Kwon, Hong-Goo Lee, Chul-Seung Lee, Myung-Goon Gil, Yong-Wook Song

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536159

KEYWORDS: Silicon, Optical lithography, Reflectivity, Oxides, Lithography, Coating, Photoresist processing, Semiconducting wafers, Semiconductors, Line edge roughness

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Proceedings Article | 16 July 2002 Paper

Improved characteristics of rainbow defects with novel wafer edge exposure technique

Kew-Chan Shim, Myoung-Soo Kim, Eung-Sok Lee, Chang-Seong Lee, Chul-Seung Lee, Myung-Goon Gil, Bong-Ho Kim, Jae-Sig In, Tae Bong Yoon, Jai-soon Kim

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473420

KEYWORDS: Semiconducting wafers, Photoresist processing, Ultraviolet radiation, Wafer-level optics, Scanning electron microscopy, Silicon, Particles, Lithography, Coating, Etching

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