Khoi A. Phan
Litho Project Manager at Applied Materials Inc
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 16 October 2017 Presentation + Paper
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Amorphous silicon, Optical lithography, Etching, Silicon, Chemical vapor deposition, Photoresist materials, Silicon films, Extreme ultraviolet, Physical vapor deposition, Head-mounted displays

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Chromium, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 5 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Air contamination, Scanners, Ultraviolet radiation, Ions, Inspection, Pellicles, Photomasks, Semiconducting wafers, Chromatography

Proceedings Article | 24 May 2004 Paper
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Reticles, Contamination, Quartz, Air contamination, Ions, Inspection, Raman spectroscopy, Pellicles, Photomasks, Chemical analysis

Proceedings Article | 11 March 2002 Paper
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Etching, Quartz, Ions, Inspection, Atomic force microscopy, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers

Showing 5 of 17 publications
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