Mr. Ki-Ho Ko Profile

Ki-Ho Ko

at Hanyang Univ

SPIE Involvement:

Author

Publications (5)

SPIE Journal Paper | 9 June 2016

Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle

Ki-Ho Ko, Soo-Yeon Mo, In-Seon Kim, Hye-Keun Oh

JM3, Vol. 15, Issue 02, 023506, (June 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.023506

KEYWORDS: Pellicles, Photomasks, Optical proximity correction, Extreme ultraviolet, Optical lithography, Image transmission, Absorption, Nanoimprint lithography, Extreme ultraviolet lithography, Logic

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Proceedings Article | 18 March 2016 Paper

Feasibility of a new absorber material for high NA extreme ultraviolet lithography

Ki-Ho Ko, Hye-Keun Oh

Proceedings Volume 9776, 97762J (2016) https://doi.org/10.1117/12.2219576

KEYWORDS: Extreme ultraviolet lithography, Optical lithography, Extreme ultraviolet, Photomasks, Lithography, Refractive index, Ruthenium, Phase velocity, Phase shifting, Nanoimprint lithography

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Proceedings Article | 18 March 2016 Paper

Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle

Ki-Ho Ko, Hye-Keun Oh, Soo-Yeon Mo, In-Seon Kim

Proceedings Volume 9776, 97760I (2016) https://doi.org/10.1117/12.2220155

KEYWORDS: Pellicles, Photomasks, Extreme ultraviolet, Optical proximity correction, Optical lithography, Extreme ultraviolet lithography, Absorption, Image transmission, Critical dimension metrology, Nanoimprint lithography

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Proceedings Article | 17 April 2014 Paper

Aerial image of mesh supported extreme ultraviolet pellicle

Ki-ho Ko, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Hye-Keun Oh, Mun-Ja Kim, Seung-Sue Kim

Proceedings Volume 9048, 90482D (2014) https://doi.org/10.1117/12.2046202

KEYWORDS: Pellicles, Extreme ultraviolet, Semiconducting wafers, Photomasks, Extreme ultraviolet lithography, Silicon, Thin films, Absorption, Optical simulations, Lithography

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Proceedings Article | 23 March 2012 Paper

Effect of extreme-ultraviolet pellicle support to patterned mask

Hye-keun Oh, Ki-ho Ko, Jun-Taek Park, Chang-Moon Lim, Ji-Won Kim, Eun-Jin Kim

Proceedings Volume 8322, 832230 (2012) https://doi.org/10.1117/12.918019

KEYWORDS: Pellicles, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Thin films, Silicon, Computer simulations, Lithography, Distortion, Data modeling

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