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Dr. Kikue Burnham
at TE Connectivity Ltd
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Publications (1)
Proceedings Article | 24 August 2001 Paper
Characterization of new aromatic polymers for 157-nm photoresist applications
Nicolette Fender, Phillip Brock, W. Chau, S. Bangsaruntip, Arpan Mahorowala, Gregory Wallraff, William Hinsberg, Carl Larson, Hiroshi Ito, Gregory Breyta, Kikue Burnham, Hoa Truong, P. Lawson, Robert Allen
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436873
KEYWORDS: Polymers, Diffusion, Absorbance, Fluorine, Etching, Photoresist materials, Lithography, Silicon, Semiconducting wafers, Transparency
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