Kiyoshi Fujii
Group Leader at Semiconductor Leading Edge Technologies Inc
SPIE Involvement:
Author
Publications (29)

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Semiconductors, Point spread functions, Electronics, Cadmium, Scattering, Scanners, Error analysis, Photomasks, Logic devices, Critical dimension metrology

Proceedings Article | 11 April 2006 Paper
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Quartz, Crystals, Photography, Scanning electron microscopy, Bridges, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Proceedings Article | 21 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Refractive index, Microfluidics, Water, Interferometry, Photoresist materials, Immersion lithography, Neodymium, Fluid dynamics, Absorption

Proceedings Article | 21 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Refractive index, Prisms, Transparency, Interferometers, Chemical species, Molecules, Immersion lithography, Fluorine, Semiconducting wafers, Liquids

Proceedings Article | 21 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Microfluidics, Optical lithography, Water, Photomasks, Resonance energy transfer, Immersion lithography, Photoresist processing, Semiconducting wafers, Standards development

Showing 5 of 29 publications
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