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Kiyoshi Kageyama
at Toppan Printing Co Ltd
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Publications (4)
Proceedings Article | 26 September 2019 Paper
Evaluation of neighborhood pattern matching algorithm in MPC processing
Proceedings Volume 11148, 111481K (2019) https://doi.org/10.1117/12.2538626
KEYWORDS: Process modeling, Manufacturing, Algorithm development, Software development, Photomasks, Optical proximity correction, Time metrology
Proceedings Article | 27 June 2019 Paper
MPC model sensitivity analysis: model ambit vs. correction runtime
Parikshit Kulkarni, John Valadez, Kohei Yanagisawa, Kota Kobayashi, Kiyoshi Kageyama, Alex Zepka
Proceedings Volume 11178, 1117808 (2019) https://doi.org/10.1117/12.2535707
KEYWORDS: Photomasks, Data modeling, Calibration, Metrology, Etching, Electrons, Lithography, Optical proximity correction, Cadmium, Semiconducting wafers
Proceedings Article | 17 October 2008 Paper
Layout driven DNIR
Shinji Kunitani, Kohei Yanagisawa, Kiyoshi Kageyama, Yoji Tonooka, Atsushi Kobayashi
Proceedings Volume 7122, 71223H (2008) https://doi.org/10.1117/12.801940
KEYWORDS: Inspection, Photomasks, Manufacturing, Optical proximity correction, Scattering, Neodymium, Printing, Carbon monoxide, Semiconductors, Photomask technology
Proceedings Article | 30 October 2007 Paper
Polygon-based compensation of proximity and density effects in photomask processes
Anwei Liu, Kiyoshi Kageyama, Gökhan Perçin, Alan Zhu, Jesus Carrero, Yoshimitsu Okuda, Apo Sezginer, Katsuyuki Miyoko
Proceedings Volume 6730, 67302Y (2007) https://doi.org/10.1117/12.746796
KEYWORDS: Photomasks, Databases, Calibration, Process modeling, Critical dimension metrology, Data modeling, Semiconducting wafers, Glasses, Etching, Model-based design
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