Dr. Kiyoshi Ogata Profile

Dr. Kiyoshi Ogata

Executive Vice President at Rigaku Corp

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Author

Publications (4)

Proceedings Article | 22 September 2020 Poster + Presentation

Measurement of cross-sectional profile for sub-15nm hp LS patterns in nanoimprint templates using small-angle x-ray scattering

Kazuki Hagihara, Eiji Yamanaka, Yoshiyasu Ito, Kiyoshi Ogata, Kazuhiko Omote, Naoya Hayashi

Proceedings Volume 11518, 1151810 (2020) https://doi.org/10.1117/12.2572462

KEYWORDS: Nanoimprint lithography, X-rays, Scattering, Scatter measurement, Quartz, Lithography, Semiconductors, Optical lithography, Semiconducting wafers, Photomasks

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Proceedings Article | 19 April 2019 Paper

Throughput improvement method for cross-sectional profile measurement of hole patterns in nanoimprint templates

Kazuki Hagihara, Rikiya Taniguchi, Eiji Yamanaka, Takashi Hirano, Kazuhiko Omote, Yoshiyasu Ito, Kiyoshi Ogata, Naoya Hayashi

Proceedings Volume 10810, 1081010 (2019) https://doi.org/10.1117/12.2503252

KEYWORDS: Nanoimprint lithography, X-rays, Quartz, Diffraction, Scattering, Nanostructures, Scanning electron microscopy, Time metrology, Transmission electron microscopy, X-ray detectors

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Proceedings Article | 16 October 2017 Presentation + Paper

The capability of measuring cross-sectional profile for hole patterns in nanoimprint templates using small-angle x-ray scattering

Kazuki Hagihara, Rikiya Taniguchi, Eiji Yamanaka, Kazuhiko Omote, Yoshiyasu Ito, Kiyoshi Ogata, Naoya Hayashi

Proceedings Volume 10451, 104510H (2017) https://doi.org/10.1117/12.2284761

KEYWORDS: X-rays, Nanoimprint lithography, Scattering, Quartz, 3D metrology, Critical dimension metrology, 3D acquisition, Scanning electron microscopy, Nanostructures, Ultraviolet radiation

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Proceedings Article | 18 May 2016 Paper

The measurement capabilities of cross-sectional profile of Nanoimprint template pattern using small angle x-ray scattering

Eiji Yamanaka, Rikiya Taniguchi, Masamitsu Itoh, Kazuhiko Omote, Yoshiyasu Ito, Kiyoshi Ogata, Naoya Hayashi

Proceedings Volume 9984, 99840V (2016) https://doi.org/10.1117/12.2246570

KEYWORDS: Diffraction, Nanoimprint lithography, Quartz, X-rays, Transmission electron microscopy, Scattering, Semiconducting wafers, Lithography, Nondestructive evaluation, Nanostructures

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Nanoimprint lithography (NIL) is one of the most potential candidates for the next generation lithography for semiconductor. It will achieve the lithography with high resolution and low cost. High resolution of NIL will be determined by a high definition template. Nanoimprint lithography will faithfully transfer the pattern of NIL template to the wafer. Cross-sectional profile of the template pattern will greatly affect the resist profile on the wafer. Therefore, the management of the cross-sectional profile is essential. Grazing incidence small angle x-ray scattering (GI-SAXS) technique has been proposed as one of the method for measuring cross-sectional profile of periodic nanostructure pattern. Incident x-rays are irradiated to the sample surface with very low glancing angle. It is close to the critical angle of the total reflection of the x-ray. The scattered x-rays from the surface structure are detected on a two-dimensional detector. The observed intensity is discrete in the horizontal (2θ) direction. It is due to the periodicity of the structure, and diffraction is observed only when the diffraction condition is satisfied. In the vertical (β) direction, the diffraction intensity pattern shows interference fringes reflected to height and shape of the structure. Features of the measurement using x-ray are that the optical constant for the materials are well known, and it is possible to calculate a specific diffraction intensity pattern based on a certain model of the cross-sectional profile. The surface structure is estimated by to collate the calculated diffraction intensity pattern that sequentially while changing the model parameters with the measured diffraction intensity pattern. Furthermore, GI-SAXS technique can be measured an object in a non-destructive. It suggests the potential to be an effective tool for product quality assurance. We have developed a cross-sectional profile measurement of quartz template pattern using GI-SAXS technique. In this report, we will report the measurement capabilities of GI-SAXS technique as a cross-sectional profile measurement tool of NIL quartz template pattern.

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