Kiyoshi Ogawa
Manager at Lasertec Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 5 September 2001 Paper
Kiyoshi Ogawa, J. Kodama, K. Machida, Katsuyoshi Nakashima, Yaichiro Watakabe
Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438389
KEYWORDS: Photomasks, Defect inspection, Prisms, Reflectivity, Inspection, Defect detection, Phase shifting, Phase interferometry, Interferometers, Databases

Conference Committee Involvement (5)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XI
14 April 2004 | Yokohama, Japan
Photomask and NGL Mask Technology X
16 April 2003 | Yokohama, Japan
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