Prof. Kiyoshi Takamasu Profile

Prof. Kiyoshi Takamasu

Professor at The Univ of Tokyo

SPIE Involvement:

Author

Area of Expertise:

Precision Measurement , Nanometer Mesurement , Uncertainty Estimation , Standards , CD-SEM , TEM

Publications (27)

Proceedings Article | 21 June 2019 Paper

Absolute distance measurement of optical path length of non-contact three-dimensional nanoprofiler based on normal vector tracing method by tandem white-light interferometer

Jungmin Kang, Takao Kitayama, Ryo Kizaki, Yui Toyoshi, Kota Hashimoto, Agustinus Winarno, Kiyoshi Takamasu, Kazuya Yamamura, Katsuyoshi Endo

Proceedings Volume 11056, 110560D (2019) https://doi.org/10.1117/12.2525071

KEYWORDS: Interferometers, Error analysis, Distance measurement, Beam splitters, Mirrors, Spherical lenses, Computer programming, Refractive index

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Proceedings Article | 26 March 2019 Presentation + Paper

Linewidth and roughness measurement of SAOP by using FIB and Planer-TEM as reference metrology

Kiyoshi Takamasu, Satoru Takahashi, Hiroki Kawada, Masami Ikota, Stefan Decoster, Frederic Lazzarino, Gian Lorusso

Proceedings Volume 10959, 109590Q (2019) https://doi.org/10.1117/12.2515989

KEYWORDS: Line width roughness, Metrology, Transmission electron microscopy, Edge detection, Image processing, Semiconducting wafers, Optical lithography, Ion beams, Scanning electron microscopy

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SPIE Journal Paper | 8 September 2018

Linewidth roughness of advanced semiconductor features using focused ion beam and planar-transmission electron microscope as reference metrology

Kiyoshi Takamasu, Satoru Takahashi, Hiroki Kawada, Masami Ikota

JM3, Vol. 17, Issue 04, 041010, (September 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041010

KEYWORDS: Line width roughness, Extreme ultraviolet, Fin field effect transistors, Edge detection, Semiconductors, Metrology, Ion beams, Electron microscopes, Line edge roughness, Transmission electron microscopy

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Proceedings Article | 22 March 2018 Presentation + Paper

Line-width roughness of advanced semiconductor features by using FIB and planar-TEM as reference metrology

Kiyoshi Takamasu, Satoru Takahashi, Hiroki Kawada, Masami Ikota

Proceedings Volume 10585, 105850E (2018) https://doi.org/10.1117/12.2296463

KEYWORDS: Line width roughness, Extreme ultraviolet, Fin field effect transistors, Transmission electron microscopy, Edge detection, Metrology, Line edge roughness, Semiconductors, Denoising

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SPIE Journal Paper | 19 June 2017

Scanning dimensional measurement using laser-trapped microsphere with optical standing-wave scale

Masaki Michihata, Shin-ichi Ueda, Satoru Takahashi, Kiyoshi Takamasu, Yasuhiro Takaya

OE, Vol. 56, Issue 06, 064103, (June 2017) https://doi.org/10.1117/12.10.1117/1.OE.56.6.064103

KEYWORDS: Laser optics, Laser development, Spherical lenses, Laser metrology, 3D metrology, Metrology, Optical testing, Sensors, Phase shifts

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Proceedings Article | 19 April 2017 Presentation + Paper

3D-profile measurement of advanced semiconductor features by using FIB as reference metrology

Kiyoshi Takamasu, Yuuki Iwaki, Satoru Takahashi, Hiroki Kawada, Masami Ikota

Proceedings Volume 10145, 101451A (2017) https://doi.org/10.1117/12.2257217

KEYWORDS: CMOS sensors, Coating, 3D metrology, Scanning transmission electron microscopy, Metrology, Transmission electron microscopy, Line width roughness, Semiconducting wafers, Semiconductors

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Proceedings Article | 8 March 2017 Paper

Distance measurement for rotation center to measurement table using triangulation method

Xicheng Wang, Muzheng Xiao, Chao Wang, Xin Jin, Zhijing Zhang, Kiyoshi Takamasu

Proceedings Volume 10255, 102553W (2017) https://doi.org/10.1117/12.2268053

KEYWORDS: Distance measurement, Deflectometry, Error analysis, Autocollimators, Mirrors, Cameras, CMOS sensors, Sensors, Aspheric optics, Aspheric lenses

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Proceedings Article | 24 March 2016 Paper

3D-profile measurement of advanced semiconductor features by reference metrology

Kiyoshi Takamasu, Yuuki Iwaki, Satoru Takahashi, Hiroki Kawada, Masami Ikota, Gian Lorusso, Naoto Horiguchi

Proceedings Volume 9778, 97781T (2016) https://doi.org/10.1117/12.2218496

KEYWORDS: Scanning transmission electron microscopy, Semiconducting wafers, Transmission electron microscopy, CMOS sensors, Metrology, Semiconductors, Edge detection, 3D metrology, Electron microscopes

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Proceedings Article | 19 March 2015 Paper

Line profile measurement of advanced-FinFET features by reference metrology

Kiyoshi Takamasu, Yuuki Iwaki, Satoru Takahashi, Hiroki Kawada, Masami Ikota, Atsuko Yamaguchi, Gian Lorusso, Naoto Horiguchi

Proceedings Volume 9424, 942406 (2015) https://doi.org/10.1117/12.2087099

KEYWORDS: Transmission electron microscopy, Silica, Silicon, Metrology, Edge detection, Electron microscopes, Image filtering, Calibration, Scanning electron microscopy

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SPIE Journal Paper | 9 September 2014

Two-color absolute length measuring method based on pulse repetition interval lengths

Dong Wei, Masato Aketagawa, Kiyoshi Takamasu, Hirokazu Matsumoto

OE, Vol. 53, Issue 12, 122413, (September 2014) https://doi.org/10.1117/12.10.1117/1.OE.53.12.122413

KEYWORDS: Mirrors, Refractive index, Distance measurement, Interferometers, Optical fibers, Second-harmonic generation, Frequency combs, Temperature metrology, Humidity, Optical testing

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Proceedings Article | 2 April 2014 Paper

Sidewall roughness and line profile measurement of photoresist and finFET features by cross-section STEM and TEM image for reference metrology

Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Osamu Inoue, Hiroki Kawada, Vimal Kamineni, Abhijeet Paul, A. Bello

Proceedings Volume 9050, 90501K (2014) https://doi.org/10.1117/12.2046144

KEYWORDS: Scanning transmission electron microscopy, Transmission electron microscopy, Photoresist materials, Metrology, Carbon, Coating, Edge detection, Silicon, Edge roughness

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Proceedings Article | 10 April 2013 Paper

Edge determination methodology for cross-section STEM image of photoresist feature used for reference metrology

Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada

Proceedings Volume 8681, 868132 (2013) https://doi.org/10.1117/12.2011103

KEYWORDS: Scanning transmission electron microscopy, Metals, Coating, Photoresist materials, Metrology, Scanning electron microscopy, Carbon, Image transmission, Electron microscopes, Calibration

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Proceedings Article | 20 November 2012 Paper

Multiple-pulse-train-interference-based measurement of refractive index of air using femtosecond optical frequency comb

Dong Wei, Kiyoshi Takamasu, Hirokazu Matsumoto

Proceedings Volume 8563, 856314 (2012) https://doi.org/10.1117/12.999797

KEYWORDS: Refractive index, Mirrors, Frequency combs, Femtosecond phenomena, Temporal coherence, Water, Light sources, Michelson interferometers, Temperature metrology, Pulsed laser operation

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Proceedings Article | 3 April 2012 Paper

Sub-nanometer calibration of line width measurement and line edge detection by using STEM and sectional SEM

Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada

Proceedings Volume 8324, 83240X (2012) https://doi.org/10.1117/12.916680

KEYWORDS: Scanning transmission electron microscopy, Silicon, Metals, Edge detection, Coating, Interfaces, Scanning electron microscopy, Silica, Calibration, Metrology

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Proceedings Article | 30 January 2012 Paper

Pulse repetition interval-based Excess Fraction method for an arbitrary and absolute distance measurement using a femtosecond optical frequency comb

Dong Wei, Kiyoshi Takamasu, Hirokazu Matsumoto

Proceedings Volume 8247, 82470K (2012) https://doi.org/10.1117/12.907636

KEYWORDS: Frequency combs, Semiconductor lasers, Distance measurement, Michelson interferometers, Mirrors, Femtosecond phenomena, Laser sources, Pulsed laser operation, Calibration, Interferometers

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Proceedings Article | 27 September 2011 Paper

Nanometer profile measurement of large aspheric optical surface by scanning deflectometry with rotatable devices

Muzheng Xiao, Satomi Jujo, Satoru Takahashi, Kiyoshi Takamasu

Proceedings Volume 8126, 81260R (2011) https://doi.org/10.1117/12.893393

KEYWORDS: Mirrors, Aspheric lenses, Deflectometry, Spherical lenses, Surface conduction electron emitter displays, Telescopes, Autocollimators, Optical components, Interferometry, Lenses

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Proceedings Article | 14 September 2011 Paper

Multi-probe system comprising three laser interferometers and one autocollimator for measuring flat bar mirror profile with nanometer accuracy on a high-precision micro-coordinate measuring machine

Ping Yang, Tomohiko Takamura, Satoru Takahashi, Kiyoshi Takamasu, Osamu Sato, Sonko Osawa, Toshiyuki Takatsuji

Proceedings Volume 8133, 81330T (2011) https://doi.org/10.1117/12.892385

KEYWORDS: Mirrors, Interferometers, Autocollimators, Laser stabilization, Sensors, Laser systems engineering, Motion measurement, Beam splitters, Receivers, Lasers

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Proceedings Article | 20 April 2011 Paper

Sub-nanometer line width and line profile measurement for CD-SEM calibration by using STEM

Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Mitsuru Konno, Osamu Inoue, Hiroki Kawada

Proceedings Volume 7971, 797108 (2011) https://doi.org/10.1117/12.879036

KEYWORDS: Scanning transmission electron microscopy, Silicon, Metals, Coating, Edge detection, Interfaces, Silica, Calibration, Scanning electron microscopy, Oxides

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Proceedings Article | 27 August 2010 Paper

Multiple image reconstruction for high-resolution optical imaging using structured illumination

S. Usuki, R. Kudo, S. Takahashi, K. Takamasu

Proceedings Volume 7800, 78000I (2010) https://doi.org/10.1117/12.861966

KEYWORDS: Spectral resolution, Image restoration, Diffraction, Digital imaging, Optical imaging, Diffraction gratings, Reconstruction algorithms, Charge-coupled devices, Point spread functions, Chemical elements

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Proceedings Article | 2 April 2010 Paper

Sub-nanometer calibration of CD-SEM line width by using STEM

Kiyoshi Takamasu, Kazuki Kuwabara, Satoru Takahashi, Takeshi Mizuno, Hiroki Kawada

Proceedings Volume 7638, 76381K (2010) https://doi.org/10.1117/12.846436

KEYWORDS: Silicon, Scanning transmission electron microscopy, Edge detection, Calibration, Oxides, Metrology, Scanning electron microscopy, Electroluminescence, Picosecond phenomena, Phase contrast

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Proceedings Article | 17 June 2009 Paper

Study on the temporal coherence function of a femtosecond optical frequency comb

Dong Wei, Satoru Takahashi, Kiyoshi Takamasu, Hirokazu Matsumoto

Proceedings Volume 7389, 73891R (2009) https://doi.org/10.1117/12.824210

KEYWORDS: Temporal coherence, Michelson interferometers, Mirrors, Femtosecond phenomena, Camera shutters, Frequency combs, Interferometry, Beam splitters, Oscilloscopes, Metrology

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Proceedings Article | 12 October 2006 Paper

Development of super-resolution optical inspection system for semiconductor defects using standing wave illumination shift

S. Usuki, H. Nishioka, S. Takahashi, K. Takamasu

Proceedings Volume 6375, 637508 (2006) https://doi.org/10.1117/12.690582

KEYWORDS: Super resolution, Light scattering, Particles, Scattering, Optical inspection, Semiconducting wafers, Inspection, Modulation, Semiconductors, Imaging systems

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Proceedings Article | 6 December 2005 Paper

Profile measurement of resist surface using multi-ball-cantilever AFM

S. Liu, S. Nagasawa, S. Takahashi, K. Takamasu

Proceedings Volume 6049, 604903 (2005) https://doi.org/10.1117/12.647962

KEYWORDS: Atomic force microscopy, Finite element methods, Thin films, Diamond, Interferometers, Chemical elements, Actuators, Semiconductors, Photoresist processing, Semiconductor materials

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Proceedings Article | 6 December 2005 Paper

Super-resolution optical inspection for semiconductor defects using standing wave shift

S. Usuki, H. Nishioka, S. Takahashi, K. Takamasu

Proceedings Volume 6049, 60490C (2005) https://doi.org/10.1117/12.648356

KEYWORDS: Scattering, Super resolution, Light scattering, Semiconductors, Diffraction, Optical inspection, Inspection, Charge-coupled devices, Semiconducting wafers, Image acquisition

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Proceedings Article | 30 April 2003 Paper

Multifractal heart rate dynamics in human cardiovascular model

Kiyoshi Kotani, Kiyoshi Takamasu, Leonid Safonov, Yoshiharu Yamamoto

Proceedings Volume 5110, (2003) https://doi.org/10.1117/12.500247

KEYWORDS: Heart, Systems modeling, Blood pressure, Motion models, Brain stem, Nervous system, Phase velocity, Neon, Physiology, Cardiovascular system

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Proceedings Article | 30 October 1997 Paper

New method for measuring the viscoelastic twist properties of nematic liquid crystals by evanescent wave scattering

Chien-Ming Chen, Keiichi Wakida, Masahiko Hiraki, Kiyoshi Takamasu, Shigeo Ozono

Proceedings Volume 3143, (1997) https://doi.org/10.1117/12.279263

KEYWORDS: Liquid crystals, Magnetism, Scattering, Molecules, Light scattering, LCDs, Interfaces, Reflectivity, Photodiodes, Prisms

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Proceedings Article | 22 September 1993 Paper

Profile measurements using multi-gray-scale pattern projection

Kiyoshi Takamasu, Tetuo Uekawa, Kazuhiko Kawakami, Shigeo Ozono, Ryosyuu Furutani

Proceedings Volume 2101, (1993) https://doi.org/10.1117/12.156360

KEYWORDS: Image processing, 3D image processing, Projection systems, Time metrology, Image compression, Binary data, CCD cameras, Liquid crystals, 3D metrology, Fringe analysis

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Showing 5 of 27 publications

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