Dr. Klaus Edinger
Head Field of Business Repair at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 23 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Photomasks, Electrons, Etching, Quartz, Ions, Chemistry, Electron beams, Molecules, Extreme ultraviolet, Particles

Proceedings Article | 17 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Photomasks, Ion beams, Ions, Chemistry, Electron beams, Quartz, Etching, Molecules, Image resolution, Extreme ultraviolet

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Scanning electron microscopy, Etching, Electron beams, Semiconducting wafers, Metals, Manufacturing, Silicon, Nanoimprint lithography, Photomasks, Ultraviolet radiation

Proceedings Article | 23 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Etching, Magnesium, Opacity, Optical properties, Bridges, Yield improvement, Cadmium, Scanning electron microscopy, Electron beams, Climatology

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Photomasks, Electron beams, Opacity, Etching, Sensors, Quartz, Resolution enhancement technologies, Chemistry, Ion implantation

Showing 5 of 17 publications
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