Mr. Klaus Simon Profile

Klaus Simon

Director at Nomis Development GmbH

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Author

Publications (8)

Proceedings Article | 7 March 2008 Paper

Imaging performance optimization for hyper-NA scanner systems in high volume production

Mark van de Kerkhof, Eelco van Setten, Andre Engelen, Vincent Plachecki, Hua-yu Liu, Emil Schmitt-Weaver, Wilbert Rooijakkers, Klaus Simon

Proceedings Volume 6924, 69241W (2008) https://doi.org/10.1117/12.773260

KEYWORDS: Scanners, Reticles, Semiconducting wafers, Critical dimension metrology, Manufacturing, Lithography, Etching, Photomasks, Imaging systems, Optimization (mathematics)

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Proceedings Article | 1 July 2002 Paper

Collinearity and stitching performance on an ASML stepper

Michael Van de Moosdijk, Ennos Van den Brink, Klaus Simon, Alexander Friz, Geoffrey Phillipps, Richard Travers, Erik Raaymakers

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472358

KEYWORDS: Semiconducting wafers, Head, Metrology, Reticles, Calibration, Distortion, Deep ultraviolet, Magnetism, Lithography, Interferometers

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Proceedings Article | 25 June 1999 Paper

Sub-100-nm imaging in x-ray lithography

Olga Vladimirsky, Niru Dandekar, Wenlong Jiang, Quinn Leonard, Klaus Simon, Srinivas Bollepalli, Yuli Vladimirsky, James Taylor

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351161

KEYWORDS: Photomasks, Lithography, X-ray lithography, Diffraction, X-rays, Opacity, Synchrotrons, Near field diffraction, Photoresist processing, Printing

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Proceedings Article | 25 June 1999 Paper

X-ray mask fabrication at CXrL

Quinn Leonard, Jaz Bansel, Lei Yang, Olga Vladimirsky, Srinivas Bollepalli, Mumit Khan, Yuli Vladimirsky, Franco Cerrina, James Taylor, Klaus Simon, Lynn Rathbun, Richard Tiberio

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351147

KEYWORDS: Photomasks, X-rays, Gold, Etching, X-ray lithography, Photoresist materials, Lithography, Silicon, Electron beam lithography, Scanning electron microscopy

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Proceedings Article | 25 June 1999 Paper

X-ray lithography: a system integration effort

Robert Selzer, John Heaton, Yuli Vladimirsky, Klaus Simon

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351164

KEYWORDS: X-ray lithography, X-rays, System integration, Semiconducting wafers, Manufacturing, X-ray sources, Photomasks, Plasma, Synchrotrons, Defense and security

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Proceedings Article | 5 June 1998 Paper

Analysis and identification of factors contributing to the overlay budget

Klaus Simon, R. Macklin, Robert Selzer, Olga Vladimirsky, Yuli Vladimirsky, Franco Cerrina

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309567

KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Photomasks, Wafer-level optics, Imaging systems, X-ray lithography, Optical resolution, X-rays, Coating

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Proceedings Article | 7 July 1997 Paper

X-ray mask replication using a Suss stepper at CXrL

Quinn Leonard, John Wallace, Olga Vladimirsky, Yuli Vladimirsky, Klaus Simon, Franco Cerrina

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275790

KEYWORDS: Photomasks, X-rays, Kinematics, Semiconducting wafers, X-ray lithography, Lithography, Silicon, Distortion, Glasses, Gold

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Proceedings Article | 7 July 1997 Paper

High-volume production stepper for x-ray lithography

Klaus Simon, R. Macklin, Robert Selzer, Quinn Leonard, Franco Cerrina

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275773

KEYWORDS: Semiconducting wafers, X-ray lithography, Optical alignment, X-rays, Photomasks, Prototyping, Lithography, Overlay metrology, Control systems, Wafer manufacturing

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Showing 5 of 8 publications

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