Dr. Klaus Simon Profile

Dr. Klaus Simon

at EMPA

SPIE Involvement:

Author

Proceedings Article | 24 December 2013 Paper

Ursina Caluori, Klaus Simon

Proceedings Volume 9067, 906721 (2013) https://doi.org/10.1117/12.2050268

KEYWORDS: Image processing, Visualization, Computer programming, Image classification, Optical character recognition, Image segmentation, Software development, Metals, Raster graphics, Analog electronics

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Proceedings Article | 25 January 2011 Paper

DIN 6164 for gamut mapping?

Ursina Caluori, Dennis Küpper, Klaus Simon

Proceedings Volume 7866, 78660A (2011) https://doi.org/10.1117/12.872423

KEYWORDS: Visualization, Image processing, Image compression, Zirconium, Standards development, CIE 1931 color space, Materials science, Associative arrays, Color imaging, Electronic imaging

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Proceedings Article | 19 January 2010 Paper

Aspects of computational geometry in gamut mapping implementations

Dennis Küpper, Klaus Simon

Proceedings Volume 7528, 75280J (2010) https://doi.org/10.1117/12.838976

KEYWORDS: Bismuth, Image segmentation, Visualization, Nanoimprint lithography, Inspection, Imaging devices, Spherical lenses, Algorithm development, Image processing algorithms and systems, Color management

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Proceedings Article | 19 January 2010 Paper

Filter methods to preserve local contrast and to avoid artifacts in gamut mapping

Marcel Meili, Dennis Küpper, Zofia Barańczuk, Ursina Caluori, Klaus Simon

Proceedings Volume 7528, 75280I (2010) https://doi.org/10.1117/12.838974

KEYWORDS: Image filtering, Image quality, Quality measurement, Algorithm development, Optical filters, Visualization, Reconstruction algorithms, Nonlinear filtering, Image enhancement, High dynamic range imaging

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Proceedings Article | 19 January 2009 Paper

An RGB color management concept based on an improved gamut mapping algorithm

Ursina Caluori, Klaus Simon

Proceedings Volume 7241, 724118 (2009) https://doi.org/10.1117/12.805320

KEYWORDS: RGB color model, Visualization, Color management, Optical filters, Standards development, Curium, Image quality, Color reproduction, Data conversion, Prototyping

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Proceedings Article | 19 January 2009 Paper

Dotgain estimation using linear least squares incorporating neighboring and clustering effects

T. Stamm, K. Simon

Proceedings Volume 7241, 72411A (2009) https://doi.org/10.1117/12.805302

KEYWORDS: Printing, Raster graphics, Fermium, Frequency modulation, Nonimpact printing, Modulation, Eye, Calibration, Instrument modeling, Data modeling

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Proceedings Article | 16 January 2006 Paper

A framework for image-dependent gamut mapping

Joachim Giesen, Eva Schuberth, Klaus Simon, Daniel Zeiter, Peter Zolliker

Proceedings Volume 6058, 605805 (2006) https://doi.org/10.1117/12.640910

KEYWORDS: Optimization (mathematics), Clouds, Stars, Detection and tracking algorithms, Associative arrays, Distance measurement, Standards development, Inkjet technology, Printing, Color reproduction

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SPIE Journal Paper | 1 January 2006

Continuity of gamut mapping algorithms

Peter Zolliker, Klaus Simon

JEI, Vol. 15, Issue 01, 013004, (January 2006) https://doi.org/10.1117/12.10.1117/1.2177631

KEYWORDS: Printing, Visualization, RGB color model, Optical spheres, Distance measurement, Inkjet technology, Photography, Algorithm development, Solids, Color reproduction

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Proceedings Article | 17 January 2005 Paper

Continuity of gamut mapping algorithms

Peter Zolliker, Markus Datwyler, Klaus Simon

Proceedings Volume 5667, (2005) https://doi.org/10.1117/12.585866

KEYWORDS: Printing, Visualization, Optical spheres, Photography, Distance measurement, RGB color model, Solids, Algorithm development, Image processing, Color reproduction

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Proceedings Article | 17 January 2005 Paper

Toward image-dependent gamut mapping: fast and accurate gamut boundary determination

Joachim Giesen, Eva Schuberth, Klaus Simon, Peter Zolliker

Proceedings Volume 5667, (2005) https://doi.org/10.1117/12.585812

KEYWORDS: Algorithm development, Associative arrays, 3D image processing, Image processing, Image compression, Quantization, Visualization, Human-machine interfaces, Detection and tracking algorithms, RGB color model

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Proceedings Article | 19 May 1995 Paper

Resolution and components of critical dimension variation in x-ray lithography

Kathleen Early, David Trindade, Quinn Leonard, Franco Cerrina, Klaus Simon, Mark McCord, Daniel DeMay

Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209183

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Etching, X-ray lithography, X-rays, Error analysis, Synchrotrons, Metrology

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Proceedings Article | 13 May 1994 Paper

Alignment accuracy improvement by consideration of wafer processing impacts

Klaus Simon, H.-U. Scheunemann, Hans Huber, P. Kaiser

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175826

KEYWORDS: Optical alignment, Semiconducting wafers, Photomasks, Digital signal processing, Signal processing, Photoresist processing, Metals, Wafer-level optics, Target recognition, Lithography

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Proceedings Article | 24 June 1993 Paper

Impact of chuck flatness on wafer distortion and stepper overlay

Klaus Simon, H.-U. Scheunemann, Hans Huber, F. Gabeli

Proceedings Volume 1924, (1993) https://doi.org/10.1117/12.146510

KEYWORDS: Semiconducting wafers, Distortion, Optical alignment, Silicon, Overlay metrology, Photomasks, X-rays, Finite element methods, Printing, Interferometers

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Proceedings Article | 9 July 1992 Paper

Alignment and overlay accuracy of an advanced x-ray stepper using an improved alignment system (Poster Paper)

F. Gabeli, Hans Huber, A. Kucinski, H.-U. Scheunemann, Klaus Simon, Elmar Cullmann

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136042

KEYWORDS: Semiconducting wafers, Optical alignment, Photomasks, X-rays, X-ray lithography, Overlay metrology, Digital signal processing, Photoresist processing, Signal processing, Wafer mounting

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Showing 5 of 14 publications

Conference Committee Involvement (1)

Eighth International Conference on Machine Vision

19 November 2015 | Barcelona, Spain

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