Mr. Kohei Nagane Profile

Kohei Nagane

at Canon Inc

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 30 April 2023 Presentation

Refinements of a nanoimprint process simulator

Shingo Ishida, Junichi Seki, Yuichiro Oguchi, Naoki Kiyohara, Koshiro Suzuki, Kohei Nagane, Shintaro Narioka, Yoshihiro Shiode, Sentaro Aihara, Toshiya Asano

Proceedings Volume 12495, 124950N (2023) https://doi.org/10.1117/12.2657058

KEYWORDS: Nanoimprint lithography, Optical lithography, Ultraviolet radiation, Physics, Performance modeling, Nanotechnology, Manufacturing equipment, Manufacturing, Lithography, Device simulation

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SPIE Journal Paper | 4 January 2022

Enabling nanoimprint simulator for quality verification: process-design co-optimization toward high-volume manufacturing

Junichi Seki, Yuichiro Oguchi, Naoki Kiyohara, Koshiro Suzuki, Kohei Nagane, Shintaro Narioka, Takahiro Nakayama, Yoshihiro Shiode, Sentaro Aihara, Toshiya Asano

JM3, Vol. 21, Issue 01, 011005, (January 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.011005

KEYWORDS: Nanoimprint lithography, Photoresist processing, Computer simulations, Distortion, Manufacturing, Head, Solids, Optical lithography, High volume manufacturing, Resistance

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Proceedings Article | 21 September 2020 Presentation

Computational lithography and its role in nanoimprint lithography for semiconductor device manufacturing

Toshiya Asano, Junichi Seki, Yuichiro Oguchi, Naoki Kiyohara, Koshiro Suzuki, Kohei Nagane, Hiromi Hiura, Keita Sakai, Mitsuru Hiura, Osamu Morimoto, Yukio Takabayashi, Takehiko Iwanaga

Proceedings Volume 11518, 115180V (2020) https://doi.org/10.1117/12.2574629

KEYWORDS: Nanoimprint lithography, Photomasks, Manufacturing, Optical lithography, Stochastic processes, Computational lithography, Semiconductor manufacturing, Semiconductors, Photoresist processing, Ultraviolet radiation

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Proceedings Article | 23 March 2020 Paper

Enabling nanoimprint simulator for quality verification; process-design co-optimization toward high volume manufacturing

Junichi Seki, Yuichiro Oguchi, Naoki Kiyohara, Koshiro Suzuki, Kohei Nagane, Shintaro Narioka, Takahiro Nakayama, Yoshihiro Shiode, Sentaro Aihara, Toshiya Asano

Proceedings Volume 11328, 113280N (2020) https://doi.org/10.1117/12.2551999

KEYWORDS: Nanoimprint lithography, Computer simulations, Photoresist processing, Manufacturing, Distortion, High volume manufacturing, Solids, Overlay metrology, Fluid dynamics

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