Koji Kaneyama
Lithography Resist Group Member at SCREEN Holdings Co., Ltd.
SPIE Involvement:
Author
Publications (29)

Proceedings Article | 27 March 2017 Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Metrology, Annealing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Thin film coatings, Semiconducting wafers, Wafer testing, Standards development

Proceedings Article | 27 March 2017 Paper
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Optical lithography, Polymers, Annealing, Oxygen, Scanning electron microscopy, Line width roughness, Directed self assembly, Thin film coatings, Semiconducting wafers, Atmospheric modeling

Proceedings Article | 1 April 2016 Paper
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Annealing, Scanning electron microscopy, Distance measurement, Directed self assembly, Immersion lithography, Semiconducting wafers

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Wafer-level optics, Scanning electron microscopy, Bridges, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Proceedings Article | 20 March 2015 Paper
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithium, Video, Silicon, Coating, Photoresist materials, High speed cameras, Extreme ultraviolet, Photoresist processing, Semiconducting wafers, Content addressable memory

Showing 5 of 29 publications
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