Mr. Koji Kikuchi Profile

Koji Kikuchi

at Univ of California Berkeley

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Author

Publications (9)

Proceedings Article | 30 October 2007 Paper

Characterization and monitoring of photomask edge effects

Marshal Miller, Andrew Neureuther, Daniel Ceperley, Juliet Rubinstein

Proceedings Volume 6730, 67301U (2007) https://doi.org/10.1117/12.746805

KEYWORDS: Photomasks, Glasses, Phase shifting, Polarization, Finite-difference time-domain method, Phase shifts, Electromagnetic simulation, Etching, Dielectrics, Diffraction

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Proceedings Article | 28 March 2007 Open Access

Collaborative platform, tool-kit, and physical models for DfM

Andy Neureuther, Wojtek Poppe, Juliet Holwill, Eric Chin, Lynn Wang, Jae-Seok Yang, Marshal Miller, Dan Ceperley, Chris Clifford, Koji Kikuchi, Jihong Choi, Dave Dornfeld, Paul Friedberg, Costas Spanos, John Hoang, Jane Chang, Jerry Hsu, David Graves, Alan Wu, Mike Lieberman

Proceedings Volume 6521, 652104 (2007) https://doi.org/10.1117/12.721199

KEYWORDS: Design for manufacturing, Photomasks, Device simulation, Computer aided design, Process modeling, Etching, Monochromatic aberrations, Manufacturing, Lithography, Chemical mechanical planarization

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Proceedings Article | 21 February 2007 Paper

Simulation for estimating smear noise and sensitivity of CCD image sensors having square pixels cells less than 2.0 um

Koji Kikuchi, Shinji Miyazawa, Yoshinori Uchida, Hiroe Kamata, Teruo Hirayama

Proceedings Volume 6501, 650105 (2007) https://doi.org/10.1117/12.704631

KEYWORDS: Signal to noise ratio, Charge-coupled devices, CCD image sensors, Image sensors, Electrons, Finite-difference time-domain method, Silicon, Photodiodes, Semiconductors, Computer simulations

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Proceedings Article | 7 June 2004 Paper

High-accuracy simulation method for CCD image sensors below 2.5-um square cell size

Koji Kikuchi, Ichiro Murakami, Toshihiro Kawamura, Mitsunori Kimura, Kazushi Kubota, Hiroe Kamata, Hideo Kanbe, Tadakuni Narabu

Proceedings Volume 5301, (2004) https://doi.org/10.1117/12.541011

KEYWORDS: Monte Carlo methods, Photoresist processing, CCD image sensors, Image processing, Ions, Diffusion, Optical lithography, Lithography, Device simulation, Image sensors

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Proceedings Article | 30 July 2002 Paper

Defect printability of alternating phase-shift mask: a critical comparison of simulation and experiment

Ken Ozawa, Tooru Komizo, Koji Kikuchi, Hidetoshi Ohnuma, Hiroichi Kawahira

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474479

KEYWORDS: Photomasks, Optical lithography, Chromium, Quartz, Critical dimension metrology, Fiber reinforced polymers, Phase shifts

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Proceedings Article | 12 July 2002 Paper

New method for reducing across-chip poly-CD variation with statistical OPC/gauge capability analysis

Hidetoshi Ohnuma, Koji Kikuchi, Hiroichi Kawahira

Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475672

KEYWORDS: Optical proximity correction, Statistical analysis, Microelectronics, Lithium, Picosecond phenomena, Optical calibration, Logic devices

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Proceedings Article | 11 March 2002 Paper

New method for reducing across chip poly-CD variation with statistical OPC/gauge capability analysis

Hidetoshi Ohnuma, Koji Kikuchi, Hiroichi Kawahira

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458311

KEYWORDS: Optical proximity correction, Critical dimension metrology, Statistical analysis, Lithography, Photomasks, Logic devices, Logic, Control systems, Optical calibration, Composites

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Proceedings Article | 5 September 2001 Paper

New optimization method of exposure with alternative phase-shifting masks

Koji Kikuchi, Hidetoshi Ohnuma, Hiroichi Kawahira

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438397

KEYWORDS: Photomasks, Logic devices, Phase shifting, Phase shifts, Quartz, Mask making, Lithography, Optical proximity correction, Fabrication, Excimer lasers

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Proceedings Article | 5 July 2000 Paper

Method of expanding process window for the double exposure technique with alt-PSMs

Koji Kikuchi, Hidetoshi Ohnuma, Hiroichi Kawahira

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388947

KEYWORDS: Photomasks, Logic, Optical proximity correction, Binary data, Chromium, Phase shifting, Lithography, Mask making, Critical dimension metrology, Excimer lasers

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Showing 5 of 9 publications

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