Mr. Kong Son Profile

Kong Son

at Seagate Technology LLC

SPIE Involvement:

Author

Proceedings Article | 4 November 2005 Paper

Evaluation and implementation of TeraScan reflected light die-to-database inspection mode for 65nm design node process

Luke T. Hsu, C.H. Ho, C. C. Lin, Vincent Hsu, Ellison Chen, Paul Yu, Kong Son

Proceedings Volume 5992, 599207 (2005) https://doi.org/10.1117/12.632108

KEYWORDS: Inspection, Contamination, Deep ultraviolet, Ultraviolet radiation, Reticles, Photomask technology, Image resolution, Sensors, Stars, Photomasks

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Proceedings Article | 4 November 2005 Paper

Process window impact of progressive mask defects: its inspection and disposition techniques (go/no-go criteria) via a lithographic detector

Jerry Huang, Lan-Hsin Peng, Chih-Wei Chu, Kaustuve Bhattacharyya, Ben Eynon, Farzin Mirzaagha, Tony Dibiase, Kong Son, Jackie Cheng, Ellison Chen, Den Wang

Proceedings Volume 5992, 599206 (2005) https://doi.org/10.1117/12.632039

KEYWORDS: Photomasks, Sensors, Inspection, Lithography, Semiconducting wafers, Defect inspection, Defect detection, Crystals, Detector development, Deep ultraviolet

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Proceedings Article | 28 June 2005 Paper

Implementation of an efficient defect classification methodology for advanced reticle inspection

Paul Yu, Vincent Hsu, Ellison Chen, Rick Lai, Kong Son, Weimin Ma, Peter Chang, Jackie Chen

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617488

KEYWORDS: Inspection, Reticles, Defect detection, Photomasks, Defect inspection, Manufacturing, Process engineering, Sensors, Image processing

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Proceedings Article | 6 December 2004 Paper

A reticle quality management strategy in wafer fabs addressing progressive mask defect growth problem at low-k1 lithography

Kaustuve Bhattacharyya, Kong Son, Benjamin Eynon, Dadi Gudmundsson, Carmen Jaehnert, Doris Uhlig

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568874

KEYWORDS: Photomasks, Reticles, Inspection, Semiconducting wafers, Lithography, Failure analysis, Data modeling, Statistical analysis, 193nm lithography, Stochastic processes

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Proceedings Article | 28 May 2004 Paper

Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET

W. Shieh, William Chou, Chuen-Huei Yang, J. Wu, Noah Chen, Shih Yen, Tony Hsu, Steve Tuan, Doris Chang, Maciej Rudzinski, Lantian Wang, Kong Son

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544243

KEYWORDS: Semiconducting wafers, Reticles, Inspection, Photomasks, Lithography, Wafer inspection, Resolution enhancement technologies, Scanning electron microscopy, Manufacturing, Critical dimension metrology

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Proceedings Article | 24 May 2004 Paper

A high-resolution contamination-mode inspection method providing a complete solution to the inspection challenges for advanced photomasks

Kaustuve Bhattacharyya, Yao-Tsu Huang, Kong Son, Den Wang, Louie Liu, C. H. Liao, Yi-Ming Dai, Jyh-Ching Lin

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.533793

KEYWORDS: Inspection, Stereolithography, Photomasks, Reticles, Contamination, Crystals, Chromium, Air contamination, Deep ultraviolet, Lithography

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Proceedings Article | 17 December 2003 Paper

High-resolution reticle inspection technique providing a complete reticle qualification solution in advanced 90-nm node wafer fabs

Louie Liu, Chi-Horng Liao, Yi-Ming Dai, Jyh-Ching Lin, Kaustuve Bhattacharyya, Yao-Tsu Huang, Kong Son, Den Wang

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518539

KEYWORDS: Inspection, Stereolithography, Reticles, Photomasks, Contamination, Crystals, Chromium, Semiconducting wafers, Defect detection, Deep ultraviolet

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Proceedings Article | 19 July 2000 Paper

Universal inspection standard for evaluation of inspection system and algorithm sensitivity and runability

Jerry Chen, Charles Howard, Kong Son, Franklin Kalk, Il-Ho Lee

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392032

KEYWORDS: Inspection, Standards development, Manufacturing, Photomasks, Scanning electron microscopy, Environmental sensing, Cadmium sulfide, Chromium, Optical proximity correction, Semiconductors

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Showing 5 of 8 publications

Conference Committee Involvement (3)

Photomask and Next Generation Lithography Mask Technology XIV

17 April 2007 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XIII

18 April 2006 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XII

13 April 2005 | Yokohama, Japan

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