Kosta S. Selinidis
ILT,OPC,RET Corporate Applications Enineer, Staff at Synopsys Inc
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 5 April 2019 Presentation + Paper
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Extreme ultraviolet, Photomasks, Stochastic processes, Lithography, Extreme ultraviolet lithography, 3D modeling, Optical lithography, Manufacturing, EUV optics, Electromagnetism

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Photomasks, Lithography, Optical lithography, 3D modeling, Optical proximity correction, Calibration, Photoresist processing, Manufacturing, Computer simulations, Source mask optimization

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: 3D modeling, Optical proximity correction, Optical lithography, Data modeling, Computational lithography, Optimization (mathematics), Photoresist processing, Source mask optimization, Scanning electron microscopy

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Photomasks, Chromium, Etching, Lithography, Semiconductors, Semiconducting wafers, Particles, Optical lithography, Optical alignment, Inspection

SPIE Journal Paper | 1 October 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Photomasks, Chromium, Lithography, Etching, Electron beam lithography, Semiconductors, Semiconducting wafers, Inspection, Optical alignment, Silica

Showing 5 of 22 publications
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