Mr. Kouichi Nakayama Profile

Kouichi Nakayama

at Sony Corp

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 21 March 2007 Paper

OPC to reduce variability of transistor properties

Kaoru Koike, Kohichi Nakayama, Kazuhisa Ogawa, Hidetoshi Ohnuma

Proceedings Volume 6521, 65210J (2007) https://doi.org/10.1117/12.711812

KEYWORDS: Transistors, Optical proximity correction, Ions, Distortion, Process modeling, Lithography, Semiconducting wafers, Manufacturing, Semiconductors, Statistical analysis

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Proceedings Article | 20 May 2006 Paper

Optimization of layout design and OPC by using estimation of transistor properties

Kaoru Koike, Kohichi Nakayama, Kazuhisa Ogawa, Hidetoshi Ohnuma

Proceedings Volume 6283, 62830P (2006) https://doi.org/10.1117/12.681850

KEYWORDS: Transistors, Optical proximity correction, Ions, Distortion, Semiconducting wafers, Lithography, Design for manufacturability, Device simulation, Photomasks, Design for manufacturing

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Proceedings Article | 6 May 2005 Paper

BEOL process technology based on proximity electron lithography: demonstration of the via-chain yield comparable with ArF lithography

S. Nohdo, S. Omori, K. Iwase, M. Yoshizawa, T. Motohashi, K. Oguni, K. Nakayama, H. Egawa, T. Takeda, T. Morikawa, S. Nohama, H. Nakano, T. Kitagawa, S. Moriya, H. Kawahira

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601733

KEYWORDS: Photomasks, Lithography, Resistance, Semiconducting wafers, Inspection, Photoresist processing, Charged-particle lithography, Back end of line, Copper, Etching

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Proceedings Article | 20 August 2004 Paper

Structure and data processing for PEL mask compatible with image placement accuracy in the 65-nm node and beyond

Kohichi Nakayama, Kensuke Tsuchiya, Shinji Omori, Hidetoshi Ohnuma

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557776

KEYWORDS: Data processing, Photomasks, Chemical elements, Error analysis, Finite element methods, Electron beam lithography, Distortion, Lithography, Computer simulations, Image processing

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SPIE Journal Paper | 1 July 2004

Progress in proximity electron lithography: demonstration of print and overlay performance using the low-energy electron beam proximity-projection lithography β-tool

Shinji Omori, Shinichiro Nohdo, Shoji Nohama, Kouichi Nakayama, Kazuya Iwase, Tomonori Motohashi, Keiko Amai, Yoko Watanabe, Kazuharu Inoue, Isao Ashida, Hidetoshi Ohnuma, Hiroyuki Nakano, Shigeru Moriya, Tetsuya Kitagawa

JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1759326

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Charged-particle lithography, Optical alignment, Metrology, Distortion, Critical dimension metrology, Electron beam lithography

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Proceedings Article | 28 August 2003 Paper

Complementary splitting with stress emulation for stencil masks

Kohichi Nakayama, Kazuharu Inoue, Isao Ashida, Shinji Omori, Hidetoshi Ohnuma

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504071

KEYWORDS: Photomasks, Finite element methods, Charged-particle lithography, Lithography, Semiconducting wafers, Liquids, Algorithm development, Silicon, Safety, Semiconductors

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Proceedings Article | 10 April 1997 Paper

Optimization of UV-light-modified multidomain cell for large-size TFT-LCDs

Shunji Suzuki, Hideo Takano, Kohichi Nakayama, Yuichi Momoi, Atsushi Takenaka

Proceedings Volume 3014, (1997) https://doi.org/10.1117/12.270299

KEYWORDS: Ultraviolet radiation, LCDs, Liquid crystals, Glasses, Optical alignment, Cell mechanics, Switching, Coating, Deep ultraviolet, Image processing

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Showing 5 of 7 publications

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