Dr. Kozo Ogino Profile

Dr. Kozo Ogino

at Fujitsu Semiconductor Ltd

SPIE Involvement:

Author

Publications (8)

SPIE Journal Paper | 7 August 2012

Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond

Yoshinori Kojima, Yasushi Takahashi, Masaki Takakuwa, Shuzo Ohshio, Shinji Sugatani, Ryo Tsujimura, Hiroshi Takita, Kozo Ogino, Hiromi Hoshino, Yoshio Ito, Masaaki Miyajima, Jun-ichi Kon

JM3, Vol. 11, Issue 3, 031403, (August 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031403

KEYWORDS: Optical alignment, Electron beam direct write lithography, Electron beams, Overlay metrology, Control systems, Semiconducting wafers, Metals, Back end of line, Backscatter, Electron beam lithography

Read Abstract +

Proceedings Article | 21 March 2012 Paper

Proximity effect correction using multilevel area density maps for character projection based electron beam direct writing toward 14 nm node and beyond

Kozo Ogino, Hiromi Hoshino, Takashi Maruyama, Yasuhide Machida, Shinji Sugatani

Proceedings Volume 8323, 832328 (2012) https://doi.org/10.1117/12.916353

KEYWORDS: Scattering, Backscatter, Laser scattering, Critical dimension metrology, Electron beams, Modulation, Photomasks, Logic, Electron beam direct write lithography, Lithography

Read Abstract +

Proceedings Article | 21 March 2012 Paper

Optimization of chemically amplified resist for high-volume manufacturing by electron-beam direct writing toward 14nm node and beyond

Jun-ichi Kon, Takashi Maruyama, Yoshinori Kojima, Yasushi Takahashi, Shinji Sugatani, Kozo Ogino, Hiromi Hoshino, Hideaki Isobe, Masaki Kurokawa, Akio Yamada

Proceedings Volume 8323, 832324 (2012) https://doi.org/10.1117/12.916305

KEYWORDS: Diffusion, Chemically amplified resists, Lithography, Manufacturing, Optical lithography, Photoresist processing, Scanning electron microscopy, Monte Carlo methods, High volume manufacturing, Beam analyzers

Read Abstract +

Proceedings Article | 21 March 2012 Paper

Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond

Yoshinori Kojima, Yasushi Takahashi, Masaki Takakuwa, Shuzo Ohshio, Shinji Sugatani, Ryo Tujimura, Hiroshi Takita, Kozo Ogino, Hiromi Hoshino, Yoshio Ito, Masaaki Miyajima, Jun-ichi Kon

Proceedings Volume 8323, 832326 (2012) https://doi.org/10.1117/12.916338

KEYWORDS: Electron beam direct write lithography, Optical alignment, Electron beams, Control systems, Semiconducting wafers, Overlay metrology, Metals, Photoresist processing, Backscatter, Electron beam lithography

Read Abstract +

Proceedings Article | 19 May 2011 Paper

Mask data processing technique using GPU for reducing computer cost

Ryo Tsujimura, Kozo Ogino, Hiromi Hoshino, Shigeo Satoh, Kazumasa Morishita, Satoshi Yoshikawa, Hiroki Futatsuya, Tatsuo Chijimatsu, Satoru Asai, Satoshi Yamauchi, Tomoyuki Okada, Naoyuki Ishiwata, Motoshu Miyajima

Proceedings Volume 8081, 80810I (2011) https://doi.org/10.1117/12.899496

KEYWORDS: Optical proximity correction, Data processing, Photomasks, Computing systems, Distributed computing, Manufacturing, Graphics processing units, Fourier transforms, Semiconductors, Digital image processing

Read Abstract +

Proceedings Article | 20 March 2008 Paper

Applying photolithography-friendly design to e-beam direct writing in 65-nm node and beyond

Hiromi Hoshino, Kozo Ogino, Yasuhide Machida, Masaaki Miyajima, Takashi Maruyama, Yoshinori Kojima, Shinji Sugatani

Proceedings Volume 6921, 69212K (2008) https://doi.org/10.1117/12.773189

KEYWORDS: Electron beam lithography, Optical lithography, Lithography, Semiconducting wafers, Photomasks, Scanning electron microscopy, Scattering, Data conversion, Maskless lithography, Semiconductors

Read Abstract +

Proceedings Article | 24 March 2006 Paper

Model-based lithography verification system for multilayer structure in electron-beam direct writing

Kozo Ogino, Hiromi Hoshino, Yasuhide Machida

Proceedings Volume 6151, 615129 (2006) https://doi.org/10.1117/12.656105

KEYWORDS: Lithography, Critical dimension metrology, Chemical mechanical planarization, Monte Carlo methods, Multilayers, Semiconducting wafers, Backscatter, Model-based design, Scattering, Systems modeling

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Model-based OPC/DRC considering local flare effects

Hiroki Futatsuya, Teruyoshi Yao, Morimi Osawa, Kozo Ogino, Hiromi Hoshino, Hiroshi Arimoto, Yasuhide Machida, Satoru Asai

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535076

KEYWORDS: Optical proximity correction, Printing, Photomasks, Model-based design, Semiconducting wafers, Light scattering, Diffraction, Acquisition tracking and pointing, Manufacturing, Lithography

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years