Mr. Kuan-Ming Chen Profile

Kuan-Ming Chen

at ASML Netherlands BV

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Author

Publications (3)

Proceedings Article | 27 April 2023 Poster + Paper

Large field of view metrology: detecting critical edge placement error signatures not seen with small field of view in an HVM environment

James Park, Abdalmohsen Elmalk, Chih-Hung Hsieh, Alexander Serebryakov, Lei Zhang, Joonsang You, Taekwon Jee, Hong-Goo Lee, Jongmin Park, Jungchan Kim, Sang-Woo Kim, Seungmo Hong, Jaewook Seo, Kuan-Ming Chen, Mohamed Ridane, Ivy Chen, Jaden Song, Peter Nikolsky, Shinyeong Lee, Sean Park, Kolos Lin, Yu-Chi Su, Kyoyeon Cho, Ethan Yu

Proceedings Volume 12496, 124963C (2023) https://doi.org/10.1117/12.2659692

KEYWORDS: Metrology, Semiconducting wafers, High volume manufacturing, Line width roughness, Critical dimension metrology, Scanning electron microscopy, Optical lithography, Environmental sensing, Edge detection, Overlay metrology

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Proceedings Article | 22 February 2021 Presentation + Paper

Edge placement error wafer mapping and investigation for improvement in advanced DRAM node

Kuan-Ming Chen, Wolfgang Henke, WeiTai Lin, Anita Bouma, Ji-Hoon Jung, JaeYoung Park, Jonggeun Won, Hsin-Yu Chen, Chih-Hung Hsieh, Abdalmohsen Elmalk, Taekwon Jee, Seung-Uk Jeong, Jeongwoo Jae, Sang-Woo Kim, Dongyoung Lee, Jungchan Kim, WonKwang Ma, Sang-Ho Lee, Chan-Ha Park, Ewa Kasperkiewicz, Gratiela Isai, Gwang-Gon Kim, Sotirios Tsiachris, Jae-Doug Yoo, Yuna Park, Nang-Lyeom Oh, Sudharshanan Raghunathan, Rizvi Rahman, Kuo-Feng Pao, Kyoyeon Cho

Proceedings Volume 11611, 116111V (2021) https://doi.org/10.1117/12.2584149

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Overlay metrology, Optical lithography, Metrology, Visualization, Statistical analysis, Lithography, Graphic design, Etching

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Proceedings Article | 20 March 2020 Paper

Enabling accurate and robust optical metrology of in device overlay

Christian Leewis, Eun-Ji Yang, Do-Haeng Lee, James Lee, Sabil Huda, Noh-Kyoung Park, Anagnostis Tsiatmas, Giulio Bottegal, Amy Wang, Filippo Belletti, Jan Jitse Venselaar, Giacomo Miceli, Izabela Saj, Sam Chen, Min-Seok Kang, Chan Hwang, Seungyoon Lee, Jeongjin Lee, Joon-Soo Park

Proceedings Volume 11325, 1132529 (2020) https://doi.org/10.1117/12.2553446

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Measurement devices, Optical metrology, Etching, Scanners, Diffractive optical elements, Wafer testing, Optical testing

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