Kunal N. Taravade
Director of Product Engineer at Synopsys Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (12)

Proceedings Article | 24 February 2021 Presentation
Proc. SPIE. 11613, Optical Microlithography XXXIV

Proceedings Article | 14 October 2011 Paper
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, 3D modeling, Optical proximity correction, Photomasks, Computer simulations, Semiconducting wafers, Wafer-level optics, Source mask optimization, Tolerancing, Data modeling

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Source mask optimization, Photomasks, Optical proximity correction, Electroluminescence, Image processing, Lithography, Semiconducting wafers, Cadmium sulfide, Optimization (mathematics), Manufacturing

Proceedings Article | 29 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Optical proximity correction, Stereolithography, Stray light, Convolution, Photomasks, Modulation transfer functions, Spatial light modulators, Semiconducting wafers, Image quality, Critical dimension metrology

Proceedings Article | 15 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Optical proximity correction, Model-based design, Resolution enhancement technologies, Atrial fibrillation, Image segmentation, Semiconducting wafers, Lithography, Tolerancing, Performance modeling, Computer simulations

Showing 5 of 12 publications
Conference Committee Involvement (3)
Optical Lithography XXXIV
22 February 2021 | Online Only, California, United States
Optical Microlithography XXXIII
25 February 2020 | San Jose, California, United States
Optical Microlithography XXXII
26 February 2019 | San Jose, California, United States
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