Mr. Kuninori Nishizawa Profile

Kuninori Nishizawa

at Hitachi High-Tech Science Corp

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Author

Publications (11)

Proceedings Article | 28 June 2013 Paper

Fuzzy pattern matching techniques for photomask layout data

Kokoro Kato, Yoshiyuki Taniguchi, Kuninori Nishizawa

Proceedings Volume 8701, 87010C (2013) https://doi.org/10.1117/12.2027851

KEYWORDS: Photomasks, Tolerancing, Optical proximity correction, Fuzzy logic, Data processing, Mirrors, Semiconducting wafers, Electronic design automation, Critical dimension metrology, Nanotechnology

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Proceedings Article | 19 May 2008 Paper

Comparison of verification methods for OASIS files: hierarchical or flat?

Kokoro Kato, Yoshiyuki Taniguchi, Masakazu Endo, Kuninori Nishizawa, Tadao Inoue, Toshiaki Fujii

Proceedings Volume 7028, 702834 (2008) https://doi.org/10.1117/12.793111

KEYWORDS: Photomasks, Data conversion, Optical proximity correction, Parallel processing, Nanotechnology, Data modeling, Standards development, Data processing, Error analysis, Explosives

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Proceedings Article | 1 November 2007 Paper

Mask rule check using priority information of mask patterns

Kokoro Kato, Yoshiyuki Taniguchi, Kuninori Nishizawa, Masakazu Endo, Tadao Inoue, Ryouji Hagiwara, Anto Yasaka

Proceedings Volume 6730, 67304F (2007) https://doi.org/10.1117/12.746549

KEYWORDS: Photomasks, Manufacturing, Inspection, Design for manufacturing, Data conversion, Software development, SRAF, Design for manufacturability, Optical proximity correction, Error analysis

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Proceedings Article | 15 May 2007 Paper

Fast file size estimation of mask data conversion from OASIS to GDS2

Masakazu Endo, Yoshiyuki Taniguchi, Kuninori Nishizawa, Kokoro Kato

Proceedings Volume 6607, 66072P (2007) https://doi.org/10.1117/12.729008

KEYWORDS: Data conversion, Photomasks, Data analysis, Error analysis, Standards development, Electronic design automation, Nanotechnology, Data processing, Data compression

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Proceedings Article | 20 May 2006 Paper

From GDSII to OASIS: practical support tools for data processing flow transition

Masakazu Endo, Kuninori Nishizawa, Kokoro Kato

Proceedings Volume 6283, 62832P (2006) https://doi.org/10.1117/12.681802

KEYWORDS: Data conversion, Data processing, Photomasks, Nanotechnology, Electronic design automation, Software development, Standards development, Optical proximity correction, Data compression, Vestigial sideband modulation

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Proceedings Article | 20 May 2006 Paper

Advanced mask rule check (MRC) tool

Kokoro Kato, Kuninori Nishizawa, Tadao Inoue, Koki Kuriyama, Toshio Suzuki, Shogo Narukawa, Naoya Hayashi

Proceedings Volume 6283, 62830O (2006) https://doi.org/10.1117/12.681848

KEYWORDS: Photomasks, Data conversion, Manufacturing, Electronic design automation, Inspection, Nanotechnology, Data processing, Optical proximity correction, Resolution enhancement technologies, Printing

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Proceedings Article | 28 June 2005 Paper

Effective IP protection method of mask data using OASIS format

Kuninori Nishizawa, Masakazu Endo, Kokoro Kato

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617152

KEYWORDS: Parallel processing, Photomasks, Image compression, Process control, Local area networks, Intellectual property, Data storage, Algorithm development, Control systems, Image processing

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Proceedings Article | 6 December 2004 Paper

IP protection of mask data by rebuilding the design hierarchy using OASIS format

Kokoro Kato, Kuninori Nishizawa, Tadao Inoue, Anto Yasaka

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.577807

KEYWORDS: Parallel processing, Data storage, Process control, Local area networks, Software development, Control systems, Nanotechnology, Photomask technology, Computing systems, Environmental sensing

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Proceedings Article | 20 August 2004 Paper

New placement algorithm of contact layer patterns for NGL stencil complementary masks

Kokoro Kato, Kuninori Nishizawa, Tadao Inoue

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557780

KEYWORDS: Photomasks, Data conversion, Reticles, Image processing, Charged-particle lithography, Distance measurement, Metals, Parallel computing, Data processing, Manufacturing

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Proceedings Article | 28 August 2003 Paper

EPL mask data conversion system EPLON

Kokoro Kato, Kuninori Nishizawa, Tamae Haruki, Tadao Inoue

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504245

KEYWORDS: Data conversion, Photomasks, Parallel processing, Reticles, Electronic design automation, Local area networks, Data modeling, Electron beams, Optical lithography, Manufacturing

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Proceedings Article | 1 August 2002 Paper

EPL data conversion system EPLON

Kokoro Kato, Kuninori Nishizawa, Tamae Haruki, Tadao Inoue

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477010

KEYWORDS: Photomasks, Data conversion, Reticles, Data modeling, Semiconducting wafers, Optical lithography, Data processing, Lithography, Computer simulations, Charged-particle lithography

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Showing 5 of 11 publications

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