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Kwang Mo K. M. Choi
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Publications (2)
SPIE Journal Paper | 22 June 2018
High-speed atomic force microscopy studies of 193-nm immersion photoresists during tetramethylammonium hydroxide development
Johnpeter Ngunjiri, Gregory Meyers, James Cameron, Yasuhiro Suzuki, Hyun Jeon, Dave Lee, Kwang Mo Choi, Jung Woo Kim, Kwang-Hwyi Im, Hae-Jin Lim
JM3, Vol. 17, Issue 02, 023506, (June 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.2.023506
KEYWORDS: Atomic force microscopy, Line edge roughness, Photoresist processing, Photoresist developing, Image processing, Standards development, Photoresist materials, Optical lithography, Polymers, Pulmonary function tests
Proceedings Article | 21 March 2016 Paper
High speed AFM studies of 193 nm immersion photoresists during TMAH development
Johnpeter Ngunjiri, Greg Meyers, Jim Cameron, Yasuhiro Suzuki, Hyun Jeon, Dave Lee, Kwang Mo Choi, Jung Woo Kim, Kwang-Hwyi Im, Hae-Jin Lim
Proceedings Volume 9779, 97790W (2016) https://doi.org/10.1117/12.2218956
KEYWORDS: Polymers, 193nm lithography, Scanners, Standards development, Immersion lithography, Extreme ultraviolet lithography
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