Kwon Lim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Defect detection, Sensors, Image processing, Inspection, Image quality, Image sensors, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Semiconductors, Defect detection, Deep ultraviolet, Image processing, Manufacturing, Inspection, Telecommunications, Photomasks, Mask making, Defect inspection

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