Mr. Kyohei Sakajiri Profile

Kyohei Sakajiri

RET Staff Engineer at Siemens EDA

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 9 July 2015 Paper

High performance ILT for hotspots repair with hierarchical pattern matching

Kyohei Sakajiri

Proceedings Volume 9658, 96580B (2015) https://doi.org/10.1117/12.2192929

KEYWORDS: Image classification, Transform theory, Double patterning technology, Lithography, Liquid phase epitaxy, Photomasks, Semiconductors, Computational lithography, Optical proximity correction, Visualization

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Proceedings Article | 28 July 2014 Paper

Use of ILT-based mask optimization for local printability enhancement

Alexander Tritchkov, Sergey Kobelkov, Sergei Rodin, Kyohei Sakajiri, Evgueni Egorov, Soung-Su Woo

Proceedings Volume 9256, 92560X (2014) https://doi.org/10.1117/12.2068493

KEYWORDS: Photomasks, Liquid phase epitaxy, SRAF, Optical proximity correction, Lithography, Resolution enhancement technologies, Manufacturing, Atrial fibrillation, Source mask optimization, Neodymium

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Proceedings Article | 28 March 2014 Paper

Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes

J. Andres Torres, Kyohei Sakajiri, David Fryer, Yuri Granik, Yuansheng Ma, Polina Krasnova, Germain Fenger, Seiji Nagahara, Shinichiro Kawakami, Benjamen Rathsack, Gurdaman Khaira, Juan de Pablo, Julien Ryckaert

Proceedings Volume 9053, 90530R (2014) https://doi.org/10.1117/12.2045328

KEYWORDS: Monte Carlo methods, Manufacturing, Lithography, Metals, Photomasks, Optical lithography, Directed self assembly, Visualization, Polymers, Design for manufacturability

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SPIE Journal Paper | 1 October 2009

Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture

Monica Kempsell, Eric Hendrickx, Alexander Tritchkov, Kyohei Sakajiri, Kenichi Yasui, Susuki Yoshitake, Yuri Granik, Geert Vandenberghe, Bruce Smith

JM3, Vol. 8, Issue 04, 043001, (October 2009) https://doi.org/10.1117/12.10.1117/1.3263702

KEYWORDS: Photomasks, Atrial fibrillation, Image quality, Photovoltaics, Lithography, Optical proximity correction, Semiconducting wafers, Phase shifts, Model-based design, Lithographic illumination

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Proceedings Article | 13 March 2009 Paper

Application of pixel-based mask optimization technique for high transmission attenuated PSM

Kyohei Sakajiri, Alexander Trichkov, Yuri Granik, Eric Hendrickx, Geert Vandenberghe, Monica Kempsell, Germain Fenger, Klaus Boehm, Thomas Scheruebl

Proceedings Volume 7275, 72750X (2009) https://doi.org/10.1117/12.813753

KEYWORDS: Photomasks, SRAF, Semiconducting wafers, Printing, Lithography, Source mask optimization, Electroluminescence, Manufacturing, Optical lithography, Reticles

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Proceedings Article | 19 May 2008 Paper

Model-based SRAF insertion through pixel-based mask optimization at 32nm and beyond

Kyohei Sakajiri, Alexander Tritchkov, Yuri Granik

Proceedings Volume 7028, 702811 (2008) https://doi.org/10.1117/12.798440

KEYWORDS: SRAF, Photomasks, Lithography, Optical proximity correction, Printing, Model-based design, Lithographic illumination, Manufacturing, Visualization, Optical lithography

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Proceedings Article | 7 March 2008 Paper

Hyper-NA imaging of 45nm node random CH layouts using inverse lithography

E. Hendrickx, A. Tritchkov, K. Sakajiri, Y. Granik, M. Kempsell, G. Vandenberghe

Proceedings Volume 6924, 69240L (2008) https://doi.org/10.1117/12.771961

KEYWORDS: Atrial fibrillation, Photomasks, Lithography, Reticles, Lithographic illumination, Photovoltaics, Optical proximity correction, Semiconducting wafers, Printing, Scanning electron microscopy

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Proceedings Article | 21 March 2007 Paper

Optimizing gate layer OPC correction and SRAF placement for maximum design manufacturability

Travis Brist, Le Hong, Ayman Yehia, Tamer Tawfik, Shumay Shang, Kyohei Sakajiri, John Sturtevant

Proceedings Volume 6521, 65211L (2007) https://doi.org/10.1117/12.712748

KEYWORDS: SRAF, Optical proximity correction, Critical dimension metrology, Manufacturing, Photomasks, Model-based design, Antimony, Design for manufacturability, Optimization (mathematics), Resolution enhancement technologies

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Proceedings Article | 20 October 2006 Paper

On objectives and algorithms of inverse methods in microlithography

Yuri Granik, Kyohei Sakajiri, Shumay Shang

Proceedings Volume 6349, 63494R (2006) https://doi.org/10.1117/12.691810

KEYWORDS: SRAF, Photomasks, Detection and tracking algorithms, Optical lithography, Image processing, Mask making, Lithography, Optical calibration, System on a chip, Manufacturing

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Proceedings Article | 20 May 2006 Paper

Model-based insertion of assist features using pixel inversion method: implementation in 65 nm node

Chi-Yuan Hung, Qingwei Liu, Kyohei Sakajiri, Shumay Shang, Yuri Granik

Proceedings Volume 6283, 62832Y (2006) https://doi.org/10.1117/12.681816

KEYWORDS: SRAF, Photomasks, Model-based design, Optical proximity correction, Metals, Lithography, Semiconducting wafers, Logic, Mask making, Inspection

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Proceedings Article | 14 March 2006 Paper

OPC to improve lithographic process window

James Word, Kyohei Sakajiri

Proceedings Volume 6156, 61561I (2006) https://doi.org/10.1117/12.655237

KEYWORDS: Optical proximity correction, Metals, Process modeling, Printing, Lithography, Model-based design, Image processing, Logic, Standards development, Visualization

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Showing 5 of 11 publications

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