Dr. Kyoko Izuha Profile

Dr. Kyoko Izuha

at Sony Corp

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 3 April 2010 Paper

Using a highly accurate self-stop Cu-CMP model in the design flow

Kyoko Izuha, Takashi Sakairi, Shunichi Shibuki, Monalisa Bora, Osama Hatem, Ruben Ghulghazaryan, Norbert Strecker, Jeff Wilson, Noritsugu Takeshita

Proceedings Volume 7641, 76410V (2010) https://doi.org/10.1117/12.845653

KEYWORDS: Data modeling, Copper, Chemical mechanical planarization, Metals, Polishing, Calibration, Electroplating, Process modeling, Optimization (mathematics), Semiconducting wafers

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Correcting lithography hot spots during physical-design implementation

Gerard Luk-Pat, Alexander Miloslavsky, Atsuhiko Ikeuchi, Hiroaki Suzuki, Suigen Kyoh, Kyoko Izuha, Frank Tseng, Linni Wen

Proceedings Volume 6349, 634920 (2006) https://doi.org/10.1117/12.692865

KEYWORDS: Model-based design, Lithography, Optical proximity correction, Metals, Resolution enhancement technologies, Semiconductors, Semiconducting wafers, Astatine, Data modeling, Process engineering

Read Abstract +

Proceedings Article | 5 May 2005 Paper

Lithography simulation system for total CD control from design to manufacturing

Toshiya Kotani, Hirotaka Ichikawa, Sachiko Kobayashi, Shigeki Nojima, Kyoko Izuha, Satoshi Tanaka, Soichi Inoue

Proceedings Volume 5756, (2005) https://doi.org/10.1117/12.601132

KEYWORDS: Data modeling, Lithography, Optical proximity correction, Resolution enhancement technologies, Photomasks, Design for manufacturing, Design for manufacturability, Manufacturing, Control systems, System integration

Read Abstract +

SPIE Journal Paper | 1 April 2004

Novel in-situ focus monitor technology in attenuated phase shift mask under actual illumination conditions

Kyoko Izuha, Masafumi Asano, Tadahito Fujisawa, Soichi Inoue

JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1669541

KEYWORDS: Photomasks, Transmittance, Semiconducting wafers, Phase shifts, Optical testing, Data conversion, Phase shifting, Wafer-level optics, Reticles, Critical dimension metrology

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Impact of OPC aggressiveness on mask manufacturability

Satoshi Tanaka, Soichi Inoue, Toshiya Kotani, Kyoko Izuha, Ichiro Mori

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504253

KEYWORDS: Optical proximity correction, Photomasks, Manufacturing, Inspection, Semiconducting wafers, Vestigial sideband modulation, Lithography, Reticles, Semiconductors, Error analysis

Read Abstract +

Proceedings Article | 26 June 2003 Paper

Novel in-situ focus monitor technology in attenuated PSM under actual illumination condition

Kyoko Izuha, Masafumi Asano, Tadahito Fujisawa, Soichi Inoue

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485364

KEYWORDS: Photomasks, Semiconducting wafers, Transmittance, Phase shifting, Reticles, Phase shifts, Critical dimension metrology, Calibration, Optical lithography, Illumination engineering

Read Abstract +

Proceedings Article | 2 June 2003 Paper

Run-to-run CD error analysis and control with monitoring of effective dose and focus

Masafumi Asano, Tadahito Fujisawa, Kyoko Izuha, Soichi Inoue

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482807

KEYWORDS: Critical dimension metrology, Reticles, Error analysis, Semiconducting wafers, Error control coding, Monte Carlo methods, Control systems, Optical lithography, Metrology, Etching

Read Abstract +

SPIE Journal Paper | 1 April 2003

Effective exposure-dose monitor technique for critical dimension control in optical lithography

Masafumi Asano, Kyoko Izuha, Tadahito Fujisawa, Soichi Inoue

JM3, Vol. 2, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1564594

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Reticles, Photoresist processing, Optical lithography, Lithography, Metrology, Error analysis, Control systems, Optical testing

Read Abstract +

Proceedings Article | 30 July 2002 Paper

CD control with effective exposure dose monitor technique in photolithography

Masafumi Asano, Kyoko Izuha, Tadahito Fujisawa, Soichi Inoue

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474577

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Reticles, Photoresist processing, Optical lithography, Control systems, Scanners, Metrology, Lithography, Optical testing

Read Abstract +

SPIE Journal Paper | 1 October 2001

Effective exposure dose measurement technologies: multitone flood exposure by unresolved gratings with multilevel opening ratio

Soichi Inoue, Tadahito Fujisawa, Kyoko Izuha

OE, Vol. 40, Issue 10, (October 2001) https://doi.org/10.1117/12.10.1117/1.1403737

KEYWORDS: Semiconducting wafers, Photoresist materials, Calibration, Photomasks, Diffraction, Floods, Image processing, Silicon, Optical lithography, Photoresist developing

Proceedings Article | 2 June 2000 Paper

Effective exposure-dose measurement in optical microlithography

Soichi Inoue, Tadahito Fujisawa, Kyoko Izuha

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386445

KEYWORDS: Semiconducting wafers, Photoresist materials, Photomasks, Calibration, Optical lithography, Image processing, Optical testing, Diffraction, Lithography, Photoresist developing

Read Abstract +

Showing 5 of 11 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years