Kyoungyoung Cho
Principle Engineer at SUNY Poly SEMATECH
SPIE Involvement:
Author
Area of Expertise:
Photolithography , Photoresist , Overlay , EUV lithography , ArF immersion
Publications (17)

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Critical dimension metrology, Nanoimprint lithography, Extreme ultraviolet, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Stochastic processes, Diffusion, Computer simulations, Calibration

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Etching, Line width roughness, Extreme ultraviolet, Image processing, Photoresist processing, Extreme ultraviolet lithography, Silicon, Lithography, Optical lithography, Photons

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Nanoparticles, Photoresist materials, Electron beam lithography, Oxides, Spectroscopy, Ions, Extreme ultraviolet lithography, Optical lithography, Carbon, Photoresist developing

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Electron beam lithography, Nanoparticles, Photoresist materials, Photoresist developing, Oxides, Lithography, Extreme ultraviolet lithography, Metals, Etching, Line edge roughness

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Line width roughness, Polymers, Amplifiers, Diffusion, Line edge roughness, Extreme ultraviolet, Semiconducting wafers, Photoresist processing, Extreme ultraviolet lithography, Molecules

Showing 5 of 17 publications
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