Kyoungsub Shin
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 15 May 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Stochastic processes, Photomasks, Data modeling, Nanoimprint lithography, Line width roughness, Calibration, Extreme ultraviolet, Photons, Scanning electron microscopy, Line edge roughness

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